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Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A

Hosaka, Yuji*; Oyama, Tomoko; Oshima, Akihiro*; Enomoto, Satoshi*; Washio, Masakazu*; Tagawa, Seiichi*

ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its excellent properties. Herein, EB-induced initial reactions of ZEP520A were investigated via pulse radiolysis (EB energy: 28 MeV, time resolution: 10 ns). Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that initial reactions in the ZEP520A solid film that are induced only by direct ionization could be simulated via pulse radiolysis in specific solutions.

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Category:Polymer Science

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