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Ion irradiation effects on tungsten-oxide films and charge state effect on electronic erosion

Matsunami, Noriaki*; Sataka, Masao*; Okayasu, Satoru; Kakiuchida, Hiroshi*

We have studied electronic- and atomic-structure modifications of polycrystalline WO$$_{3}$$ films (bandgap of $$sim$$ 3 eV) by ion irradiation. WO$$_{3}$$ films were prepared by oxidation of W films on MgO substrates and of W sheets. We find disordering or amorphization, the lattice expansion of $$sim$$ 1.5% and bandgap increase of 0.2 eV after 90 MeV Ni ion irradiation at $$sim$$ 3 $$times$$ 10$$^{12}$$ cm$$^{2}$$. A broad peak of optical absorption appears around 1.6 $$mu$$m by ion irradiation. We also find that the erosion yield by high-energy ions with the equilibrium charge exceeds 10$$^{4}$$ and that the erosion yield under ion impact with non-equilibrium charge (90 MeV Ni$$^{+10}$$) is $$sim$$ 1/5 of that with the equilibrium charge (89 MeV Ni$$^{+19}$$). Effects of depth dependence of the ion mean charge on the erosion yields are discussed. The erosion yield by low-energy ions is also presented.

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