Development of microbeam technology to expand applications at TIARA

Kamiya, Tomihiro; Sato, Takahiro; Koka, Masashi; Kada, Wataru*

Ion microbeam technology has been progressed at TIARA, aiming at expanding its applications. Micro-analyses of micro-PIGE and micro-IBIL (Ion Beam Induced Luminescence) based on the micro-PIXE have expanded a region of their analyzing objects. Micro-fabrication by mask-less irradiation on materials based on the technique of PBW (Proton Beam Writing) without etching processes was applied for optical, magnetic or other novel micro-devices fabrication. Single-ion-hitting technique which was required for reliable irradiation to biological cells or semiconductor devices progressed so that each ion hit could be monitored in real time using an efficient scintillator and a high sensitivity camera. Development of a thin film type particle detector was newly started for the same purpose. This paper summarizes the latest progress of the ion microbeam technology and applications at TIARA, and discusses their future prospects.