Ion channeling analysis of disordering behavior at Fe $_{3}$ Si(111)/Si(111) heteroepitaxial interfaces

Noguchi, Masaya*; Kawakubo, Yuki*; Narumi, Kazumasa; Sakai, Seiji; Maeda, Yoshihito

no abstracts in English

Language	:	Japanese
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Meeting title	:	第9回高崎量子応用研究シンポジウム
Held date	:	2014/10
Location (city)	:	高崎
Location (country)	:	日本
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Keywords	:	no keyword
Research Facility	:	TIARA(イオン照射研究施設)
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Cooperating Institute	:	九州工業大学

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Registration No. : BB20141988
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Ion channeling analysis of disordering behavior at FeSi(111)/Si(111) heteroepitaxial interfaces

Ion channeling analysis of disordering behavior at Fe $_{3}$ Si(111)/Si(111) heteroepitaxial interfaces