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Pulse-to-pulse transverse beam emittance controlling for MLF and MR in the 3-GeV RCS of J-PARC

J-PARC 3-GeVにおけるMLFとMRのためパルスーパルスモードでのビームエミタンスの制御

Saha, P. K.; 原田 寛之; 發知 英明; 高柳 智弘

Saha, P. K.; Harada, Hiroyuki; Hotchi, Hideaki; Takayanagi, Tomohiro

The design goal of the J-PARC RCS is not only to achieve a high power beam of 1 MW but also to ensure two different transverse sizes of the extracted beam for the MLF and MR. Namely, a wider beam profile for the MLF, while a narrower one for the MR. For that purpose we have carefully designed the RCS injection painting scheme so as to control the painting area pulse-to-pulse between MLF and MR. Because depending on the injection painting area, the extracted beam emittance can be achieved as desired. The validity of the present method has been clearly demonstrated in the experimental studies for both 181 MeV as well as for the upgraded 400 MeV injection. The extracted beam profile for the MR is measured to be sufficiently narrower as compared to that for MLF and was also quite consistent with simulation results. The system has already been in service for the user operation with good reliability. In this study, it is thus confirmed that in a multi-user high intensity machine beam parameters can be dynamically controlled and delivered as requested by the user even in simultaneous operation.

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