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Erratum; Precise control of Si(001) initial oxidation by translational kinetic energy of O$$_{2}$$ molecules

訂正; O$$_{2}$$分子の並進運動エネルギーによるSi(001)初期酸化の精密制御

寺岡 有殿; 吉越 章隆 

Teraoka, Yuden; Yoshigoe, Akitaka

We have performed experiments on surface chemical reactions using a supersonic O$$_{2}$$ molecular beam and O$$_{2}$$ gas. Translational kinetic energy values of the O$$_{2}$$ molecules have been estimated by calculations. We have noticed a mistake in the calculations. We had calculated the translational kinetic energy with gas constant $$R$$ = 1.134$$times$$10$$^{-4}$$ eV/K. However, $$R$$ = 8.617$$times$$10$$^{-5}$$ eV/K is correct. Consequently, the correct translational kinetic energy values can be obtained by multiplying those in the published article by a factor of 0.76. Even if they are corrected, conclusions and the points of arguments are as they are except the translational kinetic energy values themselves.

使用言語

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English

掲載資料名

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Japanese Journal of Applied Physics

巻

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54

号

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3

ページ数

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P. 039204_1

発行年月

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2015/03

発表会議名

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開催年月

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開催都市

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開催国

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キーワード

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Si(001); oxidation; translational kinetic energy

特許データ

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PDF

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論文URL

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https://doi.org/10.7567/JJAP.54.039204

研究データの公開先DOI

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使用施設

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SPring-8(大型放射光施設)

広報プレスリリース

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論文解説記事
(成果普及情報誌)

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受委託・共同研究相手機関

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Access

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- Accesses

InCites™

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パーセンタイル：75.24

分野：Physics, Applied

Altmetrics

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