Plasma mirror frequency-resolved optical gating for simultaneous measurement of VUV waveform and plasma formation

Itakura, Ryuji; Kumada, Takayuki ; Nakano, Motoyoshi*; Akagi, Hiroshi

This study represents a method for simultaneous measurement of a VUV waveform and time-dependent reflectivity of plasma mirror. We use a plasma mirror as ultrafast optical switching formed by an intense laser pulse and perform frequency-resolved optica gating measurement. The waveform of the VUV pulse and the time-dependent reflectivity of the plasma mirror can be retrieved with excellent agreement between obsereved and retrieved FROG traces.

Language	:	English
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Meeting title	:	6th Shanghai Tokyo Advanced Research Symposium on Ultrafast Intense Laser Science (STAR6)
Held date	:	2015/05
Location (city)	:	Hangzhou
Location (country)	:	China
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Keywords	:	VUV 波形計測; プラズマミラー; 周波数分解光ゲート
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Registration No. : BB20150148
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