Initial oxidation behavior of NiAl(210) surface induced by supersonic oxygen molecular beam at room temperature

超音速酸素分子ビームによるNiAl(210)表面の室温初期酸化の振る舞い

Xu, Y.*; 出村 雅彦*; 寺岡 有殿; 吉越 章隆 ; 櫻井 惇也*; 平野 敏幸*

Xu, Y.*; Demura, Masahiko*; Teraoka, Yuden; Yoshigoe, Akitaka; Sakurai, Junya*; Hirano, Toshiyuki*

NiAl(210)表面の超音速O分子ビーム(2.3eV)による室温酸化を高輝度放射光を利用したリアルタイム光電子分光によって調べた。O 1s, Ni 2p, Al 2p, and Ni 3pスペクトルの分子ビーム照射中の時間発展を調べた。スペクトル分析から、表面のAlとNI原子の両方が酸化され、Alの酸化の方がNiより速いことがわかった。

The initial oxidation behavior of a clean NiAl (210) surface was studied at 300 K using a supersonic O molecular beam (O SSMB) having an O translational energy of 2.3 eV, and real-time photoemission spectroscopy performed with high-brilliance synchrotron radiation. The evolution behaviors of the O 1s, Ni 2p, Al 2p, and Ni 3p spectra were examined over time during irradiation with the O SSMB. The spectral analysis revealed that both the Al atoms and the Ni atoms on the surface were oxidized; however, the oxidation of Al progressed much faster than that of Ni.