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Report No.

Preparation of an H$$_{2}$$-permselective silica membrane for the separation of H$$_{2}$$ from the hydrogen iodide decomposition reaction in the iodine-sulfur process

Myagmarjav, O.; Ikeda, Ayumi*; Tanaka, Nobuyuki; Kubo, Shinji; Nomura, Mikihiro*

A high performance hydrogen-permselective silica membrane derived from hexyltrimethoxysiline (HTMOS) Si-precursor was developed to enhance chemical equilibrium ratio of hydrogen iodide (HI) decomposition in thermochemical water-splitting iodine-sulfur (IS) process. The silica membrane, called the HTMOS membrane, was prepared via a counter diffusion chemical vapor deposition method. The HTMOS membrane prepared at an optimal condition of 450$$^{circ}$$C within 5 min showed highest H$$_{2}$$ permeance of the order of 10$$^{-7}$$ mol Pa$$^{-1}$$ m$$^{-2}$$ s$$^{-1}$$ with a H$$_{2}$$/SF$$_{6}$$ selectivity of 276. It was found that the HTMOS membrane was stable in HI exposure at 400$$^{circ}$$C during 8 h and its HI permeance was the order of 10$$^{-10}$$ mol Pa$$^{-1}$$ m$$^{-2}$$ s$$^{-1}$$. It was demonstrated that the newly developed the HTMOS membrane could be a promising candidate for HI decomposition membrane reactor at working temperature of around 400$$^{circ}$$C.



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Category:Chemistry, Physical



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