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Development of a silica membrane for H$$_{2}$$ production from HI decomposition in the IS process

HI分解反応用シリカ水素選択透過性分離膜の開発

Odtsetseg, M.; 池田 歩*; 野村 幹弘*; 久保 真治

Odtsetseg, M.; Ikeda, Ayumi*; Nomura, Mikihiro*; Kubo, Shinji

熱化学水素製造法ISプロセスにおけるHI分解反応のワンパス分解率を向上させるため、水素選択透過性シリカ膜の開発を行った。対向拡散CVDを用い、多孔質アルミナを基材(直径10mm)とした水素分離膜を作製した。H$$_{2}$$ガス, H$$_{2}$$ガスおよびSF$$_{6}$$を用いたガス透過試験により、CVDプロセス中の製膜条件(窒素ガス流量,酸素ガス流量)が膜性能(選択率)に関連すること明らかにし、製膜条件の最適化により膜性能が向上する可能性を示した。

In this study, we have developed a highly hydrogen permeable silica membrane derived from hexyltrimethoxysilane as a Si precursor using porous alumina support. Modification of alumina support tubes in the absence of and in the presence of $$gamma$$-alumina coating was carried out by a counter diffusion chemical vapor deposition (CVD). A membrane with intermediate $$gamma$$-alumina layer showed higher H$$_{2}$$ permeance (7.7 $$times$$ 10$$^{-7}$$ mol m$$^{-2}$$ s$$^{-1}$$ Pa$$^{-1}$$) than that formed directly on the $$alpha$$-alumina tube (3.8 $$times$$ 10$$^{-8}$$ mol m$$^{-2}$$ s$$^{-1}$$ Pa$$^{-1}$$). It was found that the thickness of $$gamma$$-alumina layer played an important role in the improvement of membrane permeation performance. Modified membrane based on $$gamma$$-alumina coating with a thickness of 1.5 $$mu$$m exhibited H$$_{2}$$/SF$$_{6}$$ selectivity over 3000 at 270$$^{circ}$$C, while maintaining H$$_{2}$$ permeance in the order of 10$$^{-7}$$ mol m$$^{-2}$$ s$$^{-1}$$ Pa$$^{-1}$$. The results led to the conclusion that the modified membrane is a promising candidate for further enhancement of HI decomposition in membrane reactor.

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