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Micro-orientation control of silicon polymer thin films on graphite surfaces modified by heteroatom doping

Shimoyama, Iwao  ; Baba, Yuji ; Hirao, Norie*

NEXAFS spectroscopy is applied to study orientation structures of polydimethylsilane (PDMS) films deposited on heteroatom-doped graphite substrates prepared by ion beam doping. The Si ${it K}$-edge NEXAFS spectra of PDMS show opposite trends of polarization dependence for non irradiated and N$$_{2}$$$$^{+}$$-irradiated substrates, and show no polarization dependence for an Ar$$^{+}$$-irradiated substrate. Based on a theoretical interpretation of the NEXAFS spectra via first-principles calculations, we clarify that PDMS films have lying, standing, and random orientations on the non irradiated, N$$_{2}$$$$^{+}$$-irradiated, and Ar$$^{+}$$-irradiated substrates, respectively. Furthermore, photoemission electron microscopy indicates that the orientation of a PDMS film can be controlled with microstructures on the order of $$mu$$m by separating irradiated and non irradiated areas on the graphite surface. These results suggest that surface modification of graphite using ion beam doping is useful for micro-orientation control of organic thin films.

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Category:Chemistry, Physical

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