State analysis of electrodeposited uranium compounds

Ouchi, Kazuki  ; Matsumura, Daiju   ; Tsuji, Takuya  ; Kobayashi, Toru ; Otobe, Haruyoshi  ; Kitatsuji, Yoshihiro  

We analyzed electrodeposited U compounds by X-ray absorption fine structure (XAFS) and impedance spectra measurements. The XAFS spectrum of the deposits was similar to that of U(IV) hydroxide formed by neutralizing U(IV) ion. The electrical resistances obtained from the impedance spectra of U deposits at 4 to 80 minutes after stopping electrodeposition were increased with time. These results indicate that U deposits forms U(IV) hydroxide as an intermediate and finally transforms into U(IV) oxide having generally a larger electrical resistance than a hydroxide.