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Monte Carlo simulation of surface ion-source for adsorption study of lawrencium, element 103

Sato, Tetsuya   ; Nagame, Yuichiro* ; Eichler, R.*

Element 103, lawrencium (Lr) has been pointed out that it might have significantly high volatility more than that of lutetium (Lu), the lanthanide homolog of Lr, owing to an influence of the strong relativistic effect. In our previous work, we have measured the first ionization potential of Lr by using the surface ionization method. In the method, the Lr atom was surface ionized on a tantalum surface at a high temperature. If the surface temperature is sufficiently high, the ionization efficiency of Lr can be estimated by the Saha-Langmuir (S-L) equation. However, an adsorption loss of the atoms of interest onto the metal surface could be inevitable at a low temperature. In that case, the apparent ionization efficiency would become smaller than the value predicted from the S-L equation. We have developed a Monte Carlo simulation code to estimate the adsorption loss of atoms on the ion-source surface in this work. The simulation code describes the ionization behavior of the atoms by combining the thermal ionization process in the ionizer and the adsorption-desorption process on the surface.

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