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Report No.

Oxidation reaction kinetics on transition metal surfaces observed by real-time photoelectron spectroscopy

Ogawa, Shuichi*; Zhang, B.*; Yoshigoe, Akitaka ; Takakuwa, Yuji*

The oxidation reaction kinetics on Ti(0001) and Ni(111) surfaces were observed by real-time photoelectron spectroscopy using synchrotron radiation to measure the oxidation state and oxide thickness. After the Ti(0001) surface was wholly covered by TiO with a thickness of 1.2 nm, the rapid growth of n-type TiO$$_{2}$$ proceeded through the diffusion of Ti$$^{4+}$$ ions to the TiO$$_{2}$$ surface at 400$$^{circ}$$C. A saturation of oxygen uptake on the TiO surface indicates that the O$$_{2}$$ sticking coefficient on the TiO surface is negligibly small and the segregation of Ti to the TiO surface is a trigger to initiate the TiO$$_{2}$$ growth. On the Ni(111) surface at 350$$^{circ}$$C, a thermally stable NiO$$_{x}$$ proceeded preferentially and then the growth of p-type NiO was initiated. The time evolution of NiO thickness was represented by a logarithmic growth model, where the NiO growth is governed by the electron tunneling to the NiO surface.



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