Modification of graphene by the photoemission-assisted plasma, 2; Photoelectron analysis

Takabayashi, Susumu*; Fukuda, Akito*; Naito, Haruhiro*; Tanaka, Shuto*; Yamaguchi, Hisato*; Ogawa, Shuichi*; Takakuwa, Yuji*; Tsuda, Yasutaka   ; Yoshigoe, Akitaka 

Modification and chemical modification are required in graphene applications. Photoemission-assisted plasma has attracted attention as a novel process method to prevent ion damage. In only Ar ambient, the sp3 CH peak was observed in the XPS spectrum in addition to the peak attributed to the basal structure of graphene (C-C, C-H). The six-membered ring structure of graphene is considered to be cleaved and hydrogen is added. Annealing in H ambient caused the disappearance of the sp3 C-H and sp2 C-H peaks and the appearance of a new sp3 C-C peak. This result suggests that hydrogen desorption seems to take place during annealing.