X-ray scattering study of interfacial roughness correlation in Mo/Si multilayers fabricated by ion beam sputtering

Ulyanenkov, A.*; Matsuo, R.*; Omote, Kazuhiko*; Inaba, Katsuhiko*; Harada, Jimpei*; Ishino, Masahiko; Nishii, Masanobu; Yoda, Osamu

no abstracts in English

Language	:	English
Journal	:	Journal of Applied Physics
Volume	:	87
Number	:	10
Pages	:	p.7255 - 7260
Publication Year/Month	:	2000/05
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Paper URL	:	https://doi.org/10.1063/1.372977
DOI for research data	:
Keywords	:	Mo/Si; Multilayers; X-ray Reflectivity; Diffuse Scattering; Correlation Length
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Registration No. : A19990543
JAEA Abstracts No. : 280296
Paper Submission No. : 17293

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