Representative country of application |
: | 日本 |
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Application number |
: | 2011-173260 |
Publication number |
: | 2013-035714 |
Patent number |
: | 5817977 |
Date of filing |
: | 2011/08/08 |
Date of publication |
: | 2013/02/21 |
Date of patent |
: | 2015/10/09 |
International patent classification |
: | C01G 99/00 (2010.01):G21G 4/08 (2006.01):A61K 51/00 (2006.01) |
Relevant patent |
: | 【高純度99mTc濃縮方法及び濃縮装置(特願2009-264740)】 |
Relevant other documents |
: | 【R.J.Baker, Int.J.Appl.Radiat.Isot, 22, 483-485(1971)】【J-D Lee; B-H Lee, 大韓放射線防護学会誌, 9(2), 103-111(1982)】【S.Chattopadhyay; S.S.Das; L.Barua, Appl.Radiat.Isot, 68, 1-4(2010)】 |
Published unexamined patent application |
: | |
Link for Patent Gazette |
: |
Access From 2021.3.1 |
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- Accesses |
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