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Oral presentation

Modification of graphene by the photoemission-assisted plasma, 1; Raman analysis

Fukuda, Akito*; Takabayashi, Susumu*; Naito, Haruhiro*; Tanaka, Shuto*; Yamaguchi, Hisato*; Ogawa, Shuichi*; Takakuwa, Yuji*; Tsuda, Yasutaka; Yoshigoe, Akitaka

no journal, , 

Although modification or chemical modification is necessary in graphene applications, the damage due to the modification processes is a serious problem. In this conference, it is reported that the defects confirmed by D-band peak in Raman spectroscopy can be selectively controlled by using the Townsend discharge region of photoemission-assisted plasma, which can prevent ion damage.

Oral presentation

Modification of graphene by the photoemission-assisted plasma, 2; Photoelectron analysis

Takabayashi, Susumu*; Fukuda, Akito*; Naito, Haruhiro*; Tanaka, Shuto*; Yamaguchi, Hisato*; Ogawa, Shuichi*; Takakuwa, Yuji*; Tsuda, Yasutaka; Yoshigoe, Akitaka

no journal, , 

Modification and chemical modification are required in graphene applications. Photoemission-assisted plasma has attracted attention as a novel process method to prevent ion damage. In only Ar ambient, the sp3 CH peak was observed in the XPS spectrum in addition to the peak attributed to the basal structure of graphene (C-C, C-H). The six-membered ring structure of graphene is considered to be cleaved and hydrogen is added. Annealing in H$$_{2}$$ ambient caused the disappearance of the sp3 C-H and sp2 C-H peaks and the appearance of a new sp3 C-C peak. This result suggests that hydrogen desorption seems to take place during annealing.

Oral presentation

Modification of graphene by photoemission-assisted Townsend discharge plasma

Fukuda, Akito*; Naito, Haruhiro*; Tanaka, Shuto*; Yamaguchi, Hisato*; Ogawa, Shuichi*; Takakuwa, Yuji*; Tsuda, Yasutaka; Yoshigoe, Akitaka; Takabayashi, Susumu*

no journal, , 

Graphene is a two-dimensional material. Its outstanding characteristics such as gas-barrier properties have been remarked. To improve these characteristics or find new one, its modification is indispensable; however, the existing methods may destroy or reduce properties: implantation, adsorption, and chemical modification. We have been using low-energy ion attack of photoemission-assisted Townsend discharge (PATD) plasma. In conventional radio-frequency discharge plasma, a sheath electric field may cause severe damage to graphene. Because of the displacement current, both current and voltage are difficult to measure independently and precisely. Power in watt, which is a product of current and voltage, is used as a variable. However, the current is an extensive variable and is a factor of kinetics of chemical reactions. The voltage is an intensive variable and is a factor of thermodynamics. PATD is a DC plasma. Thus, we can expect precisely-controlled graphene by PATD.

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