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論文

Repeatable photoinduced insulator-to-metal transition in yttrium oxyhydride epitaxial thin films

小松 遊矢*; 清水 亮太*; 佐藤 龍平*; Wilde, M.*; 西尾 和記*; 片瀬 貴義*; 松村 大樹; 齋藤 寛之*; 宮内 雅浩*; Adelman, J. R.*; et al.

Chemistry of Materials, 34(8), p.3616 - 3623, 2022/04

 被引用回数:6 パーセンタイル:73.76(Chemistry, Physical)

Here, we demonstrate such a highly repeatable photoinduced insulator-to-metal transition in yttrium oxyhydride (YO$$_{x}$$H$$_{y}$$) epitaxial thin films. The temperature ($$T$$) dependence of the electrical resistivity ($$rho$$) of the films transforms from insulating to metallic ($$drho/dT > 0$$) under ultraviolet laser illumination. The sample is heated (125 $$^{circ}$$C) under an Ar atmosphere to recover its original insulating state. The films recover their original metallic conductivity when subsequently subjected to ultraviolet laser illumination, showing repeatable photoinduced insulator-to-metal transition. First principles calculations show that the itinerant carriers originate from the variations in the charge states of the hydrogen atoms that occupy octahedral interstitial sites. This study indicates that tuning the site occupancy (octahedral/tetrahedral) of the hydrogen atoms exerts a significant effect on the photoresponse of metal hydrides.

論文

Bayesian sparse modeling of extended X-ray absorption fine structure to determine interstitial oxygen positions in yttrium oxyhydride epitaxial thin film

熊添 博之*; 五十嵐 康彦*; Iesari, F.*; 清水 亮太*; 小松 遊矢*; 一杉 太郎*; 松村 大樹; 齋藤 寛之*; 岩満 一功*; 岡島 敏浩*; et al.

AIP Advances (Internet), 11(12), p.125013_1 - 125013_5, 2021/12

 被引用回数:1 パーセンタイル:8.23(Nanoscience & Nanotechnology)

This letter presents a Bayesian sparse modeling method to analyze extended X-ray absorption fine structure (EXAFS) data with basis functions built on two-body signals. This method allows us to evaluate regression coefficients proportional to the radial distribution functions of the respective elements and their errors and is very effective for analysis of EXAFS with weak absorption intensity and severe signal-to-noise ratio. As an application example, we used it to analyze EXAFS of an yttrium oxyhydride (YO$$_{x}$$H$$_{y}$$) epitaxial thin film. This EXAFS data shows weak absorption intensity due to the small amount of X-ray absorption in the thin film sample. However, this approach revealed that the radial distance ratio of the second neighbor yttrium to the first neighbor oxygen coincides with that of a tetrahedral configuration. This result demonstrates that the interstitial oxygen position is tetrahedral in the YO$$_{x}$$H$$_{y}$$ thin film.

論文

Absence of ferromagnetism in MnBi$$_2$$Te$$_4$$/Bi$$_2$$Te$$_3$$ down to 6 K

深澤 拓朗*; 日下 翔太郎*; 角田 一樹; 橋爪 瑞葵*; 一ノ倉 聖*; 竹田 幸治; 出田 真一郎*; 田中 清尚*; 清水 亮太*; 一杉 太郎*; et al.

Physical Review B, 103(20), p.205405_1 - 205405_6, 2021/05

 被引用回数:7 パーセンタイル:67.62(Materials Science, Multidisciplinary)

We successfully fabricated a MnBi$$_2$$Te$$_4$$/Bi$$_2$$Te$$_3$$ heterostructure by incorporating Mn and Te inside the topmost quintuple layer of Bi$$_2$$Te$$_3$$, as unambiguously confirmed by LEED I-V scanning transmission electron microscopy measurements. The surface-state Dirac cone of the heterostructure showed little change compared to that of the pristine Bi$$_2$$Te$$_3$$ and X-ray magnetic circular dichroism measurements showed that the system was paramagnetic down to 5.6 K. These results are in contrast to the previous works on related materials that showed magnetic order around 10 K as well as theoretical predictions and suggests the intricacy of the magnetic properties of two-dimensional van der Waals magnets.

論文

Epitaxial thin film growth of europium dihydride

小松 遊矢*; 清水 亮太*; Wilde, M.*; 小林 成*; 笹原 悠輝*; 西尾 和記*; 重松 圭*; 大友 明*; 福谷 克之; 一杉 太郎*

Crystal Growth & Design, 20(9), p.5903 - 5907, 2020/09

This paper reports the epitaxial growth of EuH$$_{2}$$ thin films with an $$omega$$-scan full width at half-maximum of 0.07$$^{circ}$$, the smallest value for metal hydride thin films reported so far. The thin films were deposited on yttria-stabilized ZrO$$_{2}$$ (111) substrates using reactive magnetron sputtering. The magnetization measurement showed that the saturation magnetization is $$sim$$7 $$mu_{B}$$/Eu atom, indicating that the EuH$$_{x}$$ films are nearly stoichiometric (x $$approx$$ 2.0) and that the Curie temperature is $$sim$$20 K. The optical measurements showed a bandgap of $$sim$$1.81 eV. These values are similar to those previously reported for bulk EuH$$_{2}$$. This study paves the way for the application of metal hydrides in the field of electronics through the fabrication of high-quality metal hydride epitaxial thin films.

口頭

中性子反射率及び核反応分析法による固体電解質中Li濃度分布の決定

杉山 一生*; 齊藤 正裕*; 宮田 登*; 花島 隆泰*; 阿久津 和宏*; 青木 靖仁*; 大塚 祐二*; 武田 全康; 清水 亮太*; 一杉 太郎*

no journal, , 

固体電解質/電極界面近傍に生じる空間電荷層は、系全体の物性に大きな影響を及ぼすことから、空間電荷層内部における各元素の濃度分布を明らかにすることは極めて重要である。しかしながら、空間電荷層におけるLi濃度分布を直接的かつ定量的に測定した報告はなかった。そこで本研究では、固体電解質に電圧印加($$pm$$5V)しつつ、ラザフォード後方散乱(RBS), 核反応分析法(NRA)、そして、中性子反射率測定を行い、nmから数十$$mu$$mまでの広いレンジで固体電解質/電極界面近傍のLi濃度分布を明らかにすることに成功した。

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