検索対象:     
報告書番号:
※ 半角英数字
 年 ~ 
 年
検索結果: 3 件中 1件目~3件目を表示
  • 1

発表形式

Initialising ...

選択項目を絞り込む

掲載資料名

Initialising ...

発表会議名

Initialising ...

筆頭著者名

Initialising ...

キーワード

Initialising ...

使用言語

Initialising ...

発行年

Initialising ...

開催年

Initialising ...

選択した検索結果をダウンロード

論文

Selective epitaxial growth of Ca$$_{2}$$NH and CaNH thin films by reactive magnetron sputtering under hydrogen partial pressure control

Chon, S.*; 福谷 克之; 他8名*

Journal of Physical Chemistry Letters (Internet), 13(43), p.10169 - 10174, 2022/11

 被引用回数:0 パーセンタイル:0.00(Chemistry, Physical)

Calcium compounds with N and H are promising catalysts for NH$$_{3}$$ conversion, and their epitaxial thin films provide a platform to quantitatively understand the catalytic activities. Here we report the selective epitaxial growth of Ca$$_{2}$$NH and CaNH thin films by controlling the hydrogen partial pressure ($$P_{H_{2}}$$) during reactive magnetron sputtering. We find that the hydrogen charge states can be tuned by $$P_{H_{2}}$$: Ca$$_{2}$$NH containing H$$^{-}$$ is formed at $$P_{H_{2}}<0.04$$ Pa, while CaNH containing H$$^{+}$$ is formed at $$P_{H_{2}}>0.04$$ Pa. In situ plasma emission spectroscopy reveals that the intensity of the Ca atomic emission ($$sim$$422 nm) decreases as $$P_{H_{2}}$$ increases, suggesting that Ca reacts with H$$_{2}$$ and N$$_{2}$$ to form Ca$$_{2}$$NH at lower $$P_{H_{2}}$$, whereas at higher $$P_{H_{2}}$$, CaH$$_{x}$$ is first formed on the target surface and then sputtered to produce CaNH. This study provides a novel route to control the hydrogen charge states in Ca-N-H epitaxial thin films.

論文

Accelerating the adoption of advanced manufacturing technologies for Gen IV nuclear reactors through international collaboration

Van Rooyen, I. J.*; Ivan, L.*; Messner, M.*; Edwards, L.*; Abonneau, E.*; 上地 優; Lowe, S.*; Nilsson, K.-F.*; 岡島 智史; Pouchon, M.*; et al.

Proceedings of 4th International Conference on Generation IV and Small Reactors (G4SR-4), p.2 - 12, 2022/10

Developments in advanced manufacturing (AM) are occurring faster than the ability to introduce new materials and methods into design codes. Qualifying new AM technologies for use with nuclear design codes can be a long and complex process. The Generation IV International Forum (GIF) Advanced Manufacturing Materials Engineering Task Force (AMME-TF), focuses on how collaborative AM R&D could be used to decrease time to deployment of Gen-IV reactors. This paper provides a critical review of 2019 and 2021 surveys sampling nuclear reactor vendors, supply chain specialists, regulators, and other experts in GIF member countries. Both surveys confirmed that many AM technologies were considered opportunities by potential end users, although 90% of respondents identified the creation and approval of codes and standards as the greatest obstacle to their adoption. Industry prioritization on AM technologies, components and materials changed significantly during the three-year timespan. Additionally, the paper summarizes a 2021 modeling & simulation workshop that developed ideas on how to accelerate the qualification of AM and synthesizes the survey results and workshop conclusions into a review of critical research gaps and paths to address these gaps, particularly through international collaboration.

論文

A Multi-reflection time-of-flight mass spectrograph for short-lived and super-heavy nuclei

Schury, P. H.*; 和田 道治*; 伊藤 由太*; Naimi, S.*; 園田 哲*; 三田 浩希*; 高峰 愛子*; 岡田 邦宏*; Wollnik, H.*; Chon, S.*; et al.

Nuclear Instruments and Methods in Physics Research B, 317(Part B), p.537 - 543, 2013/12

 被引用回数:29 パーセンタイル:88.45(Instruments & Instrumentation)

極短寿命の原子核の高精度質量測定を実現する目的のために、理化学研究所において多反射時間飛行法(MRTOF)による質量分析を実施した。とりわけ大きな興味の対象としているのはr過程元素合成や超ウラン原子核の質量測定である。このような原子核に対しては、MRTOFはこれまで伝統的に質量測定に使われてきたペニングトラップ法に比べてよりよいパフォーマンスを与えることができる。われわれはMRTOFが与える質量測定の相対精度が$$10^{-7}$$にまで達し、そして重く、短寿命な原子核に適用可能であることをいくつかの実例を示しながら紹介する。

3 件中 1件目~3件目を表示
  • 1