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高橋 伸明*; 村田 裕彦*; 三堀 仁志*; 桜庭 順二*; 曽我 知洋*; 青木 康*; 加藤 隆典*; 齋藤 勇一; 山田 圭介; 池永 訓昭*; et al.
Review of Scientific Instruments, 85(2), p.02C306_1 - 02C306_3, 2014/02
被引用回数:2 パーセンタイル:11.13(Instruments & Instrumentation)Microwave ion source is one of the long-life ion sources, which has been developed for industrial applications such as ion implantation. In this paper, the characteristics of the extracted Ar ion beam from the plasma were studied under various conditions, in terms of magnetic field and pressure of gas. The measured spectra show that, within the experimental condition, most of the beam constituents were singly charged ions, Ar in contrast to ECR ion sources which permits to obtain high current useful for ion implantation. The details of the beam characteristics will be presented corresponding the magnetic field and the pressure of gas.
奥地 茂人*; 作道 訓之*; 河裾 厚男; 前川 雅樹
放射線と産業, (105), p.24 - 28, 2005/03
フレキシブル性を有するガスバリア性高分子材料の開発を目的に、PET(Polyethylene terephthalate)シート表面をイオン注入により改質し、種々の放射線(イオン,光電子,陽電子など)による分析結果を踏まえながら、ガスバリア性能発現のメカニズム解明を試みた。