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論文

Development of a D$$_2$$O/H$$_2$$O vapor generator for contrast-variation neutron scattering

有馬 寛*; 高田 慎一; 笠井 聡*; 大内 啓一*; 森川 利明*; 宮田 登*; 宮崎 司*; 青木 裕之; 岩瀬 裕希*; 廣井 孝介; et al.

Journal of Applied Crystallography, 56(6), p.1802 - 1812, 2023/12

The contrast-variation technique in neutron scattering experiments plays a pivotal role in distinguishing partial structures within multi-component complexes, facilitating the elucidation of distinct sample constituents. This differentiation is achieved using different isotopes, namely hydrogen and deuterium, which possess varying neutron scattering characteristics. This study presents a novel vapor generator designed for neutron scattering experiments, enabling continuous control of the D$$_2$$O/H$$_2$$O ratio of the vapor. This feature is especially useful for contrast-variation studies. The generator features two saturators and four mass flow controllers, allowing for the rapid and independent generation of D$$_2$$O/H$$_2$$O vapors. Additionally, the incorporation of the two-temperature method ensures accurate dew point control within a margin of $$pm$$0.2$$^{circ}$$Cdp. This setup proves useful for conducting time-resolved experiments and can accelerate research on functional polymers, such as polymer electrolyte membranes for fuel cells, where water potential assumes critical importance.

論文

Neutron reflectometry analysis of condensed water layer formation at a solid interface of epoxy resins under high humidity

Liu, Y.*; 宮田 登*; 宮崎 司*; 春藤 淳臣*; 川口 大輔*; 田中 敬二*; 青木 裕之

Langmuir, 39(29), p.10154 - 10162, 2023/06

 被引用回数:0 パーセンタイル:56.68(Chemistry, Multidisciplinary)

Water absorbed by epoxy resins from a humid atmosphere considerably influences their structure and properties. Examining the effects of absorbed water on epoxy resins at their interfaces with solid substrates is crucial because of their adhesive applications in various fields. The spatial distribution of absorbed water in epoxy resin thin films under high humidity was investigated in this study by neutron reflectometry. Water molecules were found to accumulate at the SiO$$_{2}$$/epoxy resin interface after exposure at a relative humidity of 85% for 8 h. The formation of an ca.1 nm-thick condensed water layer was observed, and the thickness of this layer varied with curing conditions of epoxy systems. Furthermore, the water accumulation at the interface was noted to be affected by high-temperature and high-humidity environments. The formation of the condensed water layer is presumed to be related to the features of the polymer layer near the interface. The construction of the interface layer of epoxy resin would be affected by the interface constraint effect on the cross-linked polymer chain during the curing reaction. This study provides essential information for understanding the factors influencing the accumulation of water at the interface in epoxy resins. In the practical application, the process of improving the construction of epoxy resin near the interface would be a reasonable solution to resist the water accumulation in the interface.

論文

Neutron reflectivity study on the nanostructure of PMMA chains near substrate interfaces based on contrast variation accompanied with small molecule sorption

下北 啓輔*; 山本 勝宏*; 宮田 登*; 中西 洋平*; 柴田 基樹*; 竹中 幹人*; 山田 悟史*; 瀬戸 秀樹*; 青木 裕之; 宮崎 司*

Soft Matter, 19(11), p.2082 - 2089, 2023/03

In the case of poly(methyl methacrylate) (PMMA) thin films on a Si substrate, thermal annealing induces the formation of a layer of PMMA chains tightly adsorbed near the substrate interface, and the strongly adsorbed PMMA remains on the substrate, even after washing with toluene (hereinafter called adsorbed sample). Neutron reflectometry revealed that the concerned structure consists of three layers: an inner layer (tightly bound on the substrate), a middle layer (bulk-like), and an outer layer (surface) in the adsorbed sample. When an adsorbed sample was exposed to toluene vapor, it became clear that, between the solid adsorption layer (which does not swell) and bulk-like swollen layer, there was a "buffer layer" that could sorb more toluene molecules than the bulk-like layer. This buffer layer was found not only in the adsorbed sample but also in the standard spin-cast PMMA thin films on the substrate. When the polymer chains were firmly adsorbed and immobilized on the Si substrate, the freedom of the possible structure right next to the tightly bound layer was reduced, which restricted the relaxation of the conformation of the polymer chain strongly. The "buffer layer" was manifested by the sorption of toluene with different scattering length density contrasts.

論文

Neutron reflectivity study on the suppression of interfacial water accumulation between a polypropylene thin film and Si substrate using a silane-coupling agent

下北 啓輔*; 山本 勝宏*; 宮田 登*; 有馬 寛*; 中西 洋平*; 竹中 幹人*; 柴田 基樹*; 山田 悟史*; 瀬戸 秀樹*; 青木 裕之; et al.

Langmuir, 38(41), p.12457 - 12465, 2022/10

We measured the neutron reflectivity (NR) of isotactic polypropylene (PP) thin films deposited on Si substrates modified by hexamethyldisilazane (HMDS) at the saturated vapor pressure of deuterated water at 25$$^{circ}$$C and 60$$^{circ}$$C/85% RH to investigate the effect of HMDS on the interfacial water accumulation in PP-based polymer/inorganic filler nanocomposites and metal/resin bonding materials. We found that the amount of water accumulated at the PP/Si interface decreased with increasing immersion time of the Si substrate in a solution of HMDS in hexane prior to PP film deposition. During the immersion of the Si substrate, the HMDS molecules were deposited on the Si substrate as a monolayer without aggregation. Furthermore, the coverage of the HMDS monolayer on the Si substrate increased with increasing immersion time. At 60$$^{circ}$$C and 85% RH, only a slight amount of interfacial water was detected after HMDS treatment for 1200 min. As a result, the maximum concentration of interfacial water was reduced to 0.1 from 0.3, where the latter corresponds to the PP film deposited on the untreated substrate.

論文

Kinetics of the interfacial curing reaction for an epoxy-amine mixture

Yamaguchi, Ko*; 川口 大輔*; 宮田 登*; 宮崎 司*; 青木 裕之; Yamamoto, Satoru*; 田中 敬二*

Physical Chemistry Chemical Physics, 24(36), p.21578 - 21582, 2022/09

A better understanding of the chemical reaction between epoxy and amine compounds at a solid interface is crucial for the design and fabrication of materials with appropriate adhesive strength. Here, we examined the curing reaction kinetics of epoxy phenol novolac and 4,4'-diaminodiphenyl sulfone at the outermost interface using sum-frequency generation spectroscopy, and X-ray and neutron reflectivity in conjunction with a full atomistic molecular dynamics simulation. The reaction rate constant was much larger at the quartz interface than in the bulk. While the apparent activation energy at the quartz interface obtained from an Arrhenius plot was almost identical to the bulk value, the frequency factor at the quartz interface was greater than that in the bulk. These results could be explained in terms of the densification and orientation of reactants at the interface, facilitating the encounter of the reactants present.

論文

In situ neutron reflectometry analysis of interfacial structure formation between phenolic resin and silica during curing

和泉 篤士*; 首藤 靖幸*; 柴山 充弘*; 宮田 登*; 宮崎 司*; 青木 裕之

Langmuir, 37(47), p.13867 - 13872, 2021/11

 被引用回数:2 パーセンタイル:15.56(Chemistry, Multidisciplinary)

The structural formation mechanism of phenolic resin-silica interfaces was investigated in situ by neutron reflectometry during curing. There was a 4 nm thick novolac resin adsorption layer on the silica surface before curing. The curing reaction of the novolac resin with hexamethylenetetramine (HMTA) increased the coherent neutron scattering length density of the resin due to the cure shrinkage accompanied by the volatilization of ammonia, which is a byproduct of HMTA decomposition. As curing proceeded at 180$$^{circ}$$C, the thickness of the bulk layer increased despite the cure shrinkage, and the thickness of the interfacial layer decreased from 4 to 1 nm. This is attributed to the diffusion of decomposed HMTA fragments generated in the bulk layer into the interfacial novolac adsorption layer during diffusion throughout the bulk layer, incorporating the upper part of the interfacial layer reacting with the fragment into the bulk layer. On the other hand, the fragments could not diffuse into the tightly bound immobile segments of novolac resin in direct contact with the silica surface, retaining the 1-2 nm thick interfacial layer in the cured resin. This structural formation mechanism caused interfacial cross-link inhomogeneity in the cured resin on the silica surface.

論文

Improved performance of wide bandwidth neutron-spin polarizer due to ferromagnetic interlayer exchange coupling

丸山 龍治; 山崎 大; 青木 裕之; 阿久津 和宏*; 花島 隆泰*; 宮田 登*; 曽山 和彦; Bigault, T.*; Saerbeck, T.*; Courtois, P.*

Journal of Applied Physics, 130(8), p.083904_1 - 083904_10, 2021/08

 被引用回数:2 パーセンタイル:28.82(Physics, Applied)

Ferromagnetic (FM) interlayer exchange coupling of ion-beam sputtered Fe/Ge multilayers was investigated by off-specular polarized neutron scattering measurements. We observed a monotonously growing correlation of magnetic moments in the out-of-plane direction with decreasing Ge thickness. The results of the Fe/Ge multilayers were used to invoke FM interlayer exchange coupling in a neutron polarizing supermirror in order to extend its bandwidth. Typically, the bandwidth is limited due to a Curie temperature close to room temperature of the thinnest Fe layers with less than 3 nm. We propose a modified layer sequence of the neutron polarizing supermirror, where the minimum Fe thickness was set to 3.5 nm whereas the Ge thickness was reduced. A performance test of the neutron polarizing supermirror showed that the FM interlayer exchange coupling contributed to the presence of the magnetization comparable to the bulk and resulted in a marked extension in the bandwidth.

論文

Layered structure in the crystalline adsorption layer and the leaching process of poly(vinyl alcohol) revealed by neutron reflectivity

宮崎 司*; 宮田 登*; 有馬 寛*; 吉良 弘*; 大内 啓一*; 笠井 聡*; 津村 佳弘*; 青木 裕之

Langmuir, 37(32), p.9873 - 9882, 2021/08

 被引用回数:4 パーセンタイル:39.59(Chemistry, Multidisciplinary)

We investigated the structure of the crystalline adsorption layer of poly(vinyl alcohol) (PVA) in hot water by neutron reflectivity in two cases: when the adsorption layer is exposed on the substrate by leaching the upper bulk layer and when it is deeply embedded between a relatively thick PVA film and substrate. In both cases, the PVA adsorption layer consists of three layers on the Si substrate. The bottom layer, consisting of amorphous chains that are strongly constrained on the substrate, is not swollen even in hot water at 90$$^{circ}$$C. The middle layer, consisting of amorphous chains that are much more mobile compared with those in the bottom layer, has no freedom to assume a crystalline form. Only the molecular chains in the top layer are crystallizable in the adsorption layer, leading to a heterogeneous layered structure in the film thickness direction. This layered structure is attributed to the crystallizable chains of PVA during the formation of the adsorption layer driven by hydrogen bonding. However, the structure and dynamics in the adsorption layer may differ in both cases because the molecular chains in the vicinity of the surface seem to be affected by surface effects even in the adsorption layer.

論文

東海再処理施設ガラス固化処理施設の分析セルに係る設備・機器の保全技術の構築

青谷 樹里; 宮田 克彦*; 寺門 章仁*; 小堤 洋治*; 黒澤 太輝*; 砂庭 崇敦*; 大山 勇登*; 稲田 聡

日本保全学会第17回学術講演会要旨集, p.507 - 512, 2021/07

東海再処理施設ガラス固化処理施設の分析セルでは、ガラス固化処理の運転管理及びガラス固化体の品質管理のため、高放射性廃液の分析を実施している。分析セルには、遠隔操作のためのマスタースレーブマニプレータ、視認性確保のための照明器具、全酸化物量の分析に使用する電子天秤、元素分析に使用する誘導結合プラズマ発光分光分析装置が設置されている。ガラス固化処理においては、高放射性廃液の分析が必須であるため、これらの設備、機器は、常時、健全性を担保しておく必要がある。われわれは、約20年に渡る設備、機器の運用経験で得た知見を踏まえ、汚染、被ばく、負傷リスクを低減し、作業労力,時間,コストを最適化した自主保全技術を構築した。

論文

Improvement in sputtering rate uniformity over large deposition area of large-scale ion beam sputtering system

丸山 龍治; 山崎 大; 阿久津 和宏*; 花島 隆泰*; 宮田 登*; 青木 裕之; 曽山 和彦

JPS Conference Proceedings (Internet), 33, p.011092_1 - 011092_6, 2021/03

中性子偏極スーパーミラーは、熱及び冷中性子ビームを偏極するための光学素子であり、実機への応用には高偏極率であるとともに必要な外部磁場を小さく抑えること、即ち偏極スーパーミラーを構成する磁気多層膜が磁気的にソフトであることが重要である。本発表では、J-PARC MLFの共用ビームラインBL17等を用いて得られた偏極スーパーミラーの高偏極率化、及び磁気多層膜の軟磁性化を目指しこれを構成する多層膜特有の磁気特性の解明に関する成果について議論する。

論文

Neutron reflectivity on the mobile surface and immobile interfacial layers in the poly(vinyl acetate) adsorption layer on a Si substrate with deuterated toluene vapor-induced swelling

宮崎 司*; 下北 啓輔*; 山本 勝宏*; 青木 裕之; 山田 悟史*; 宮田 登*

Langmuir, 36(49), p.15181 - 15188, 2020/12

We investigated the polymer chain dynamics in a 2-3 nm thick poly(vinyl acetate) (PVAc) adsorption layer on a Si substrate with a native oxide layer via neutron reflectometry combined with toluene vapor-induced swelling. We can investigate the polymer chain dynamics difference in the film thickness direction by the difference in the degree of swelling of the polymer layers detected by neutron reflectometry. The mobility of the polymer chains depends on the distance from the substrate. The results elucidated that the interfacial layer with a thickness of approximately 1 nm did not swell at all with toluene vapor, which is a solvent for PVAc. Meanwhile, the surface layer excessively swells with toluene vapor compared to the bulk. This indicates that the polymer chain within the interfacial region is immobilized by the substrate through hydrogen-bonding interaction, but in the surface region, the surface effect overcomes this interfacial interaction. We concluded that the polymer chains in the adsorption layer are either strongly constrained to the substrate, owing to hydrogen bonding, or more mobile than the bulk, owing to the surface effect.

論文

Fine-structure analysis of perhydropolysilazane-derived nano layers in deep-buried condition using polarized neutron reflectometry

阿久津 和宏*; 吉良 弘*; 宮田 登*; 花島 隆泰*; 宮崎 司*; 笠井 聡*; 山崎 大; 曽山 和彦; 青木 裕之

Polymers (Internet), 12(10), p.2180_1 - 2180_10, 2020/10

 被引用回数:2 パーセンタイル:7.27(Polymer Science)

A large background scattering originating from the sample matrix is a major obstacle for fine-structure analysis of a nanometric layer buried in a bulk material. As polarization analysis can decrease undesired scattering in a neutron reflectivity (NR) profile, we performed NR experiments with polarization analysis on a polypropylene (PP)/perhydropolysilazane-derived SiO$$_{2}$$ (PDS)/Si substrate sample, having a deep-buried layer of SiO$$_{2}$$ to elucidate the fine structure of the nano-PDS layer. This method offers unique possibilities for increasing the amplitude of the Kiessig fringes in the higher scattering vector (Qz) region of the NR profiles in the sample by decreasing the undesired background scattering. Fitting and Fourier transform analysis results of the NR data indicated that the synthesized PDS layer remained between the PP plate and Si substrate with a thickness of approximately 109 ${AA}$;. Furthermore, the scattering length density of the PDS layer, obtained from the background subtracted data appeared to be more accurate than that obtained from the raw data. Although the density of the PDS layer was lower than that of natural SiO$$_{2}$$, the PDS thin layer had adequate mechanical strength to maintain a uniform PDS layer in the depth-direction under the deep-buried condition.

論文

Gas-flow humidity control system for neutron reflectivity measurements

有馬 寛*; 宮田 登*; 吉田 鉄生*; 笠井 聡*; 大内 啓一*; Zhang, S.*; 宮崎 司*; 青木 裕之

Review of Scientific Instruments, 91(10), p.104103_1 - 104103_7, 2020/10

We developed a novel humidity control system for neutron reflectivity measurements based on the two-way gas-flow method that can generate up to 85% relative humidity (RH) within a temperature range of 5-85$$^{circ}$$C. The system consists of a gas-flow-type humidity generator and a thermostatic sample chamber, each of which can independently control the temperature. The key features include rapid humidity response and long stable operation time. The humidity reaches equilibrium within 2 to 5 min during the humidity change, and the system exhibited acceptable stability over a three-day, nonstop experimental measurement duration, with a precision of $$pm$$1% RH at 85$$^{circ}$$C and 85% RH. The sample chamber is capable of measuring substrate samples with dimensions of up to 2-in. in diameter and 5-mm in thickness. We demonstrate the reflectivity data measured at a pulsed neutron facility, MLF BL17, in the Japan Proton Accelerator Research Complex. The combined use of this system with neutrons permits in situ, time-resolved studies of the swelling process of polyvinyl alcohol and adhesive materials.

論文

Interfacial cross-link inhomogeneity of a phenolic resin on a silica surface as revealed by X-ray and neutron reflection measurements

和泉 篤士*; 首藤 靖幸*; 柴山 充弘*; 吉田 鉄生*; 宮田 登*; 宮崎 司*; 青木 裕之

Macromolecules, 53(10), p.4082 - 4089, 2020/05

 被引用回数:7 パーセンタイル:33.53(Polymer Science)

The interfacial structure of a hexamethylenetetramine-cured phenolic resin on a silica surface was investigated by the complementary use of X-ray and neutron reflectivity (XRR and NR, respectively). The contrast-variation technique was applied using D$$_{2}$$O for the NR analysis in which the coherent neutron scattering length density (SLD) largely changed owing to the D$$_{2}$$O absorption of the dry phenolic resin and the hydrogen-to-deuterium exchange of phenolic hydroxyl groups. The XRR profile indicated no clear interfacial structure in terms of the mass density, whereas the NR profile indicated the presence of an interfacial nanolayer on the native silica surface according to the SLD. The thickness of the interfacial layer was 1-2 nm, which was independent of the thickness of the bulk resin layer. The formation of the interfacial layer on the silica surface could be caused by preferential adsorption of the novolac resin on the silica surface via strong hydrogen bonding between phenolic units in the novolac resin and silica surface comprising silanol and silyl ether groups resulting in interfacial cross-link inhomogeneity of the phenolic resin on the silica surface in the thickness direction. To the best of our knowledge, this is the first report of an experimental elucidation of the buried interfacial structure between the phenolic resins on the silica surface at a nanometer level.

論文

Detailed structural study on the poly(vinyl alcohol) adsorption layers on a Si substrate with solvent vapor-induced swelling

宮崎 司*; 宮田 登*; 吉田 鉄生*; 有馬 寛*; 津村 佳弘*; 鳥飼 直也*; 青木 裕之; 山本 勝宏*; 金谷 利治*; 川口 大輔*; et al.

Langmuir, 36(13), p.3415 - 3424, 2020/04

 被引用回数:12 パーセンタイル:59.54(Chemistry, Multidisciplinary)

We investigated in detail the structures in the poly(vinyl alcohol) (PVA) adsorption layers on a Si substrate, which remained on the substrate after immersing the relatively thick 30 - 50 nm films in hot water, by neutron reflectometry under humid conditions. For the PVA with a degree of saponification exceeding 98 mol %, the adsorption layer exhibits a three-layered structure in the thickness direction. The bottom layer is considered to be the so-called inner adsorption layer that is not fully swollen with water vapor. This may be because the polymer chains in the inner adsorption layer are strongly constrained onto the substrate, which inhibits water vapor penetration. The polymer chains in this layer have many contact points to the substrate via the hydrogen bonding between the hydroxyl groups in the polymer chain and the silanol groups on the surface of the Si substrate and consequently exhibit extremely slow dynamics. Therefore, it is inferred that the bottom layer is fully amorphous. Furthermore, we consider the middle layer to be somewhat amorphous because parts of the molecular chains are pinned below the interface between the middle and bottom layers. The molecular chains in the top layer become more mobile and ordered, owing to the large distance from the strongly constrained bottom layer; therefore, they exhibit a much lower degree of swelling compared to the middle amorphous layer. Meanwhile, for the PVA with a much lower degree of saponification, the adsorption layer structure consists of the two-layers. The bottom layer forms the inner adsorption layer that moderately swells with water vapor because the polymer chains have few contact points to the substrate. The molecular chains in the middle layer, therefore, are somewhat crystallizable because of this weak constraint.

論文

Elucidation of a heterogeneous layered structure in the thickness direction of poly(vinyl alcohol) films with solvent vapor-induced swelling

宮崎 司*; 宮田 登*; 浅田 光則*; 津村 佳弘*; 鳥飼 直也*; 青木 裕之; 山本 勝宏*; 金谷 利治*; 川口 大輔*; 田中 敬二*

Langmuir, 35(34), p.11099 - 11107, 2019/08

 被引用回数:19 パーセンタイル:68.25(Chemistry, Multidisciplinary)

We investigated the swelling behaviors of poly(vinyl alcohol) (PVA) films deposited on Si wafers with water vapor, which is a good solvent for PVA for elucidating structural and dynamical heterogeneities in the film thickness direction. Using deuterated water vapor, structural and dynamical differences in the thickness direction can be detected easily as different degrees of swelling in the thickness direction by neutron reflectivity. Consequently, the PVA film with a degree of saponification exceeding 98 mol % exhibits a three-layered structure in the thickness direction. It is considered that an adsorption layer consisting of molecular chains that are strongly adsorbed onto the solid substrate is formed at the interface with the substrate, which is not swollen with water vapor compared with the bulk-like layer above it. The adsorption layer is considered to exhibit significantly slower dynamics than the bulk. Furthermore, a surface layer that swells excessively compared with the underneath bulk-like layer is found. This excess swelling of the surface layer may be related to a higher mobility of the molecular chains or lower crystallinity at the surface region compared to the underneath bulk-like layer. Meanwhile, for the PVA film with a much lower degree of saponification, a thin layer with a slightly lower degree of swelling than the bulk-like layer above it can be detected at the interface between the film and substrate only under a high humidity condition. This layer is considered to be the adsorption layer composed of molecular chains loosely adsorbed onto the Si substrate.

論文

Highlight of recent sample environment at J-PARC MLF

河村 聖子; 服部 高典; Harjo, S.; 池田 一貴*; 宮田 登*; 宮崎 司*; 青木 裕之; 渡辺 真朗; 坂口 佳史*; 奥 隆之

Neutron News, 30(1), p.11 - 13, 2019/05

日本の中性子散乱施設の特徴のひとつとして、循環型冷凍機のように頻繁に使われる試料環境(SE)機器は各装置の担当者が整備していることが挙げられる。装置担当者は、ユーザー実験の際、装置自体だけでなく、これらのSE機器の運用も行う。このような運用には、SE機器を装置にあわせて最適化できユーザーの要求を直接きくことができるというメリットがある。一方で、MLFのSEチームは、より高度なSE機器を使った実験を可能にするため、共通のSE機器を整備している。本レポートでは、最近のMLFにおけるSE機器の現状が紹介される。中性子装置BL11, BL19, BL21, BL17で用いられるSE機器と、SEチームによって最近整備された機器に焦点をあてる。

論文

Development of high-polarization Fe/Ge neutron polarizing supermirror; Possibility of fine-tuning of scattering length density in ion beam sputtering

丸山 龍治; 山崎 大; 阿久津 和宏*; 花島 隆泰*; 宮田 登*; 青木 裕之; 武田 全康; 曽山 和彦

Nuclear Instruments and Methods in Physics Research A, 888, p.70 - 78, 2018/04

 被引用回数:3 パーセンタイル:30.45(Instruments & Instrumentation)

イオンビームスパッタ法で成膜されたFe/Si及びFe/Ge多層膜に対して、X線及び偏極中性子反射率、走査型透過電子顕微鏡と組み合わされたエネルギー分散型X線分光分析等のプローブによって層構造や局所元素分析を行った。その結果、Fe/Ge多層膜のGe層に含まれたスパッタリングガスであるArが含まれることにより、Ge層の散乱長密度が減少し、(-)スピンの中性子に対するFeとGeの散乱長密度のコントラストがほぼ消失し偏極中性子反射において高偏極率となることがわかった。Ge層に含まれるArは、成膜時においてAeがGeターゲットで後方散乱することに起因することが知られており、偏極スーパーミラーの高偏極率化に必要な(-)スピン中性子に対する散乱長密度コントラストを微調整する新たな手法となる可能性を示すものである。この結果を基に、Niの5倍の全反射臨界角をもつFe/Ge偏極スーパーミラーを成膜し偏極反射率測定を行った結果、(+)スピン中性子の反射率が0.70以上、偏極率はビームラインの偏極性能が正しく補正されている領域においては0.985以上という高い偏極率を達成した。

論文

概況報告 軽水炉燃料再処理技術の研究開発 3.1低放射性濃度廃液貯蔵施設(LWSF)3.2低放射性廃棄物処理技術開発施設(LWTF)

真道 隆治; 宮田 和俊; 石井 清登; 市野沢 仁

サイクル機構技報, (18), 121- Pages, 2003/00

「サイクル機構技報」第18号にLWSF、LWTFの概況報告を掲載する。

論文

軽水炉燃料再処理技術の研究開発

真道 隆治; 宮田 和俊; 石井 清登; 市野沢 仁; 稲野辺 和秀*

サイクル機構技報, (17), p.154 - 157, 2002/12

「サイクル機構技報」第17号にLWSF、LWTFの概況報告を掲載する。

33 件中 1件目~20件目を表示