JOPSS - Search Results

Journal Articles

Characterization of monolayer oxide formation processes on high-index Si surface by photoelectron spectroscopy with synchrotron radiation

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

Applied Physics Express, 6(11), p.115701_1 - 115701_4, 2013/11

https://doi.org/10.7567/APEX.6.115701

Times Cited Count：4 Percentile：18.35(Physics, Applied)

Journal Articles

Development of a resonant laser ionization gas cell for high-energy, short-lived nuclei

Sonoda, Tetsu*; Wada, Michiharu*; Tomita, Hideki*; Sakamoto, Chika*; Takatsuka, Takaaki*; Furukawa, Takeshi*; Iimura, Hideki; Ito, Yuta*; Kubo, Toshiyuki*; Matsuo, Yukari*; et al.

Nuclear Instruments and Methods in Physics Research B, 295, p.1 - 10, 2013/01

https://doi.org/10.1016/j.nimb.2012.10.009

Times Cited Count：21 Percentile：83.85(Instruments & Instrumentation)

no abstracts in English

Oral presentation

Analysis of temperature dependence in thermal oxidation process on high-index Si surfaces

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, ,

no abstracts in English

Oral presentation

Analysis of initial oxidation process of high-index Si surfaces using supersonic molecular beam, 2

Ono, Shinya*; Kanemura, Rui*; Abe, Sosuke*; Inoue, Kei*; Momose, Tatsuya*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, ,

no abstracts in English

Oral presentation

Real-time observation of thermal oxidation process on high-index silicon surfaces by means of photoemission spectroscopy with synchrotron radiation

Ono, Shinya*; Abe, Sosuke*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, ,

Oral presentation

Analysis of temperature dependence in thermal oxidation process on high-index Si surfaces, 2

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, ,

no abstracts in English

Oral presentation

Interface structures and electronic states of Si $_{2}$ /Si in oxidation processes of Si high index surfaces

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, ,

no abstracts in English

Oral presentation

Investigation of the difference between thermal oxidation and supersonic molecular beam induced oxidation on Si(113)

Ono, Shinya*; Abe, Sosuke*; Kanemura, Rui*; Miura, Shu*; Narishige, Takuma*; Inoue, Kei*; Momose, Tatsuya*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; et al.

no journal, ,

no abstracts in English

Oral presentation

Analysis of electronic states on oxidized Si(113) surfaces

Ono, Shinya*; Abe, Sosuke*; Miura, Shu*; Narishige, Takuma*; Yoshigoe, Akitaka; Teraoka, Yuden; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, ,

no abstracts in English

Oral presentation

Analysis of electronic states in initial oxidation processes on Si(113)

Ono, Shinya*; Abe, Sosuke*; Miura, Shu*; Narishige, Takuma*; Yoshigoe, Akitaka; Teraoka, Yuden; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, ,

no abstracts in English

Oral presentation

Initial oxidation processes on Si(113) surfaces at room temperature

Tanaka, Kazuma*; Ono, Shinya*; Kodama, Hiraku*; Abe, Sosuke*; Miura, Shu*; Narishige, Takuma*; Yoshigoe, Akitaka; Teraoka, Yuden; Tanaka, Masatoshi*

no journal, ,

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Characterization of monolayer oxide formation processes on high-index Si surface by photoelectron spectroscopy with synchrotron radiation

Development of a resonant laser ionization gas cell for high-energy, short-lived nuclei

Analysis of temperature dependence in thermal oxidation process on high-index Si surfaces

Analysis of initial oxidation process of high-index Si surfaces using supersonic molecular beam, 2

Real-time observation of thermal oxidation process on high-index silicon surfaces by means of photoemission spectroscopy with synchrotron radiation

Analysis of temperature dependence in thermal oxidation process on high-index Si surfaces, 2

Interface structures and electronic states of Si $_{2}$ /Si in oxidation processes of Si high index surfaces

Investigation of the difference between thermal oxidation and supersonic molecular beam induced oxidation on Si(113)

Analysis of electronic states on oxidized Si(113) surfaces

Analysis of electronic states in initial oxidation processes on Si(113)

Initial oxidation processes on Si(113) surfaces at room temperature