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Klahold, W. M.*; Devaty, R. P.*; Choyke, W. J.*; Kawahara, Kotaro*; Kimoto, Tsunenobu*; Oshima, Takeshi
Materials Science Forum, 778-780, p.273 - 276, 2014/02
Devaty, R. P.*; Yan, F.*; Choyke, W. J.*; Gali, A.*; Kimoto, Tsunenobu*; Oshima, Takeshi
Materials Science Forum, 717-720, p.263 - 266, 2012/05
Times Cited Count:1 Percentile:52.89(Materials Science, Multidisciplinary)Yan, F.*; Devaty, R. P.*; Choyke, W. J.*; Gali, A.*; Kimoto, Tsunenobu*; Oshima, Takeshi; Pensl, G.*
Applied Physics Letters, 100(13), p.132107_1 - 132107_3, 2012/03
Times Cited Count:4 Percentile:17.62(Physics, Applied)Reshanov, S. A.*; Beljakowa, S.*; Zippelius, B.*; Pensl, G.*; Danno, Katsunori*; Alfieri, G.*; Kimoto, Tsunenobu*; Onoda, Shinobu; Oshima, Takeshi; Yan, F.*; et al.
Materials Science Forum, 645-648, p.423 - 426, 2010/00
n- and p-type 4H-SiC epilayers were irradiated with electrons at 170 keV or 1 MeV. Subsequent annealing (in Ar, 30 min) up to 1700 C was carried out. Defects in the samples were investigated using DLTS (Deep Level Transient Spectroscopy). As a results, for n-type, dominant defects were Z1/Z2 and EH7, and they can observed for both 170 keV- and 1 MeV-irradiated samples. Both defects decreased with increasing temperature up to 1100
C, although they appeared again at 1400
C. Then they disappeared at 1600
C. For p-type, defects named UK1 and HK2 were observed and they were very stable. No significant decrease was observed after 1700
C annealing.
Beljakowa, S.*; Reshanov, S. A.*; Zippelius, B.*; Krieger, M.*; Pensl, G.*; Danno, Katsunori*; Kimoto, Tsunenobu*; Onoda, Shinobu; Oshima, Takeshi; Yan, F.*; et al.
Materials Science Forum, 645-648, p.427 - 430, 2010/00
Defects in Al-doped p-type 4H-SiC were investigated using admittance spectroscopy (AS). Also, defects in 4H-SiC irradiated with electrons and He ions were studied using AS. As a result, a shallow level with activation energy at 170 meV was found and is has the capture cross section of 3.510
/cm
which is extremely low value. The concentration of the defect did not change even after electron and He irradiations. Also, the defect can be found after annealing at 1800
C. Therefore, we can conclude that the defect is a very stable intrinsic defect in SiC.
Yan, F.*; Devaty, R. P.*; Choyke, W. J.*; Danno, Katsunori*; Alfieri, G.*; Kimoto, Tsunenobu*; Onoda, Shinobu; Oshima, Takeshi; Reshanov, S. A.*; Beljakowa, S.*; et al.
Materials Science Forum, 645-648, p.419 - 422, 2010/00
Defects in n- and p-type 4H-SiC epitaxial layer were investigated by low temperature photoluminescence spectroscopy (LTPL) and deep level transient spectroscopy (DLTS). Defects were introduced by either 170 keV or 1 MeV electron irradiation into samples at RT. The samples were annealed from 25C to 1700
C in 100
C steps. As a result of LTPL measurements, L
line was observed after irradiation. In previous studies, L
line is thought to correlate with Z
/Z
centers in DLTS measurements. However, in this study, no correlation between L
and Z
1/Z
was observed.
Yan, F.*; Devaty, R. P.*; Choyke, W. J.*; Kimoto, Tsunenobu*; Oshima, Takeshi; Pensl, G.*; Gali, A.*
Materials Science Forum, 645-648, p.411 - 414, 2010/00
Silicon Carbide (SiC) samples were irradiated with electron, proton and He ions and defects in the irradiated SiC were investigated by Low Temperature Photo Luminescence (LTPL). After irradiation, PL spectra between 2.48 and 2.62 eV were measured at 7 K. As a results, several PL lines were observed. These lines showed the same annealing behavior and were annealed out between 1300 and 1400
C. Therefore, it is concluded that these line have the same origin. In addition, as a result of simulation, the structure of the defect is determined to be di-carbon antisite.