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論文

Neutron reflectivity study on the nanostructure of PMMA chains near substrate interfaces based on contrast variation accompanied with small molecule sorption

下北 啓輔*; 山本 勝宏*; 宮田 登*; 中西 洋平*; 柴田 基樹*; 竹中 幹人*; 山田 悟史*; 瀬戸 秀樹*; 青木 裕之; 宮崎 司*

Soft Matter, 19(11), p.2082 - 2089, 2023/03

 被引用回数:0 パーセンタイル:0(Chemistry, Physical)

In the case of poly(methyl methacrylate) (PMMA) thin films on a Si substrate, thermal annealing induces the formation of a layer of PMMA chains tightly adsorbed near the substrate interface, and the strongly adsorbed PMMA remains on the substrate, even after washing with toluene (hereinafter called adsorbed sample). Neutron reflectometry revealed that the concerned structure consists of three layers: an inner layer (tightly bound on the substrate), a middle layer (bulk-like), and an outer layer (surface) in the adsorbed sample. When an adsorbed sample was exposed to toluene vapor, it became clear that, between the solid adsorption layer (which does not swell) and bulk-like swollen layer, there was a "buffer layer" that could sorb more toluene molecules than the bulk-like layer. This buffer layer was found not only in the adsorbed sample but also in the standard spin-cast PMMA thin films on the substrate. When the polymer chains were firmly adsorbed and immobilized on the Si substrate, the freedom of the possible structure right next to the tightly bound layer was reduced, which restricted the relaxation of the conformation of the polymer chain strongly. The "buffer layer" was manifested by the sorption of toluene with different scattering length density contrasts.

論文

Neutron reflectivity study on the suppression of interfacial water accumulation between a polypropylene thin film and Si substrate using a silane-coupling agent

下北 啓輔*; 山本 勝宏*; 宮田 登*; 有馬 寛*; 中西 洋平*; 竹中 幹人*; 柴田 基樹*; 山田 悟史*; 瀬戸 秀樹*; 青木 裕之; et al.

Langmuir, 38(41), p.12457 - 12465, 2022/10

 被引用回数:0 パーセンタイル:0(Chemistry, Multidisciplinary)

We measured the neutron reflectivity (NR) of isotactic polypropylene (PP) thin films deposited on Si substrates modified by hexamethyldisilazane (HMDS) at the saturated vapor pressure of deuterated water at 25$$^{circ}$$C and 60$$^{circ}$$C/85% RH to investigate the effect of HMDS on the interfacial water accumulation in PP-based polymer/inorganic filler nanocomposites and metal/resin bonding materials. We found that the amount of water accumulated at the PP/Si interface decreased with increasing immersion time of the Si substrate in a solution of HMDS in hexane prior to PP film deposition. During the immersion of the Si substrate, the HMDS molecules were deposited on the Si substrate as a monolayer without aggregation. Furthermore, the coverage of the HMDS monolayer on the Si substrate increased with increasing immersion time. At 60$$^{circ}$$C and 85% RH, only a slight amount of interfacial water was detected after HMDS treatment for 1200 min. As a result, the maximum concentration of interfacial water was reduced to 0.1 from 0.3, where the latter corresponds to the PP film deposited on the untreated substrate.

論文

Defect formation and accumulation in CeO$$_{2}$$ irradiated with swift heavy ions

安田 和弘*; 江藤 基稀*; 澤田 憲一*; 山本 知一*; 安永 和史*; 松村 晶*; 石川 法人

Nuclear Instruments and Methods in Physics Research B, 314, p.185 - 190, 2013/11

 被引用回数:34 パーセンタイル:92.49(Instruments & Instrumentation)

核燃料模擬物質CeO$$_{2}$$において、高エネルギー核分裂片による照射損傷形態を詳細に調べるために、210MeV Xeイオンの照射量を系統的に変えた試料をそれぞれ透過型電子顕微鏡で観察した。その結果、イオンの軌跡から動径方向に半径8.4nmの範囲で、既に形成されていたイオントラックが消滅すること(照射アニーリング)が分かった。したがって、CeO$$_{2}$$中の高エネルギーイオンの通過によって、イオントラックの形成および転位ループの形成が引き起こされるだけでなく、照射アニーリングの効果も存在することが初めて示された。イオンの影響領域が、繰り返し重畳する1$$times$$10$$^{20}$$ions/m$$^{2}$$の高照射量領域では、転位ループ(ドットコントラスト)や転位線も観察されることが分かった。この高照射量領域になると、高密度の転位蓄積が転位壁を形成したことに起因すると考えられる微小結晶粒の形成も観察された。

論文

Accumulation of radiation damage and disordering in MgAl$$_{2}$$O$$_{4}$$ under swift heavy ion irradiation

安田 和弘*; 山本 知一*; 江藤 基稀*; 川副 慎治*; 松村 晶*; 石川 法人

International Journal of Materials Research, 102(9), p.1082 - 1088, 2011/09

 被引用回数:12 パーセンタイル:52.07(Metallurgy & Metallurgical Engineering)

原子炉照射環境において優れた耐照射損傷性を示すスピネル結晶について、高い耐照射損傷性のメカニズムを原子レベルで解明することを目的として、高速重イオン照射に伴うMgAl$$_{2}$$O$$_{4}$$スピネルの照射損傷を、高分解能透過型電子顕微鏡法及び高角度分解電子チャネリングX線分光法を駆使して精密に調べた。その結果、イオンの通過する軌跡に沿って形成される損傷領域は、中心部分にNaCl型結晶構造に相転移した領域(直径約1nm)、その周辺部にMgとAlの原子サイト間移動が起きている乱れ領域(直径約10-12nm)の多重構造で構成されることが明らかになった。

口頭

Developments of pulsed neutron imaging system with camera-type detectors at J-PARC

瀬川 麻里子; 甲斐 哲也; 大井 元貴; 篠原 武尚; 江藤 剛治*; 新井 正敏; 呉田 昌俊

no journal, , 

Two kinds of neutron energy resolved imaging system with a time-of-flight technique have been newly developed and installed at Japan Proton Accelerator Research Complex (J-PARC) with the aim to investigate more rapidly a spatial distribution of several elements and crystals in various kinds of materials or substances. Firstly, a high-speed video camera (CMOS) equipped the system allows to obtain TOF images consecutively resolved into narrow energy ranges in the pulsed neutron energy region from 0.01 to a few keV. Qualities of the images obtained with the system, such as spatial resolution, dependence of the brightness on the neutron energy and measurement errors ($$sim$$2 %) of the system were examined experimentally and evaluated by comparison with those of conventional imaging system. The results obtained in the experiments show that the system can visualize the neutron energy resolved images within a small error even at high speed. Secondly, we developed a high resolution on-line neutron imaging system in order to visualize transient phenomena. The system allows us to obtain a TOF image in the pulsed neutron at J-PARC. We will report the entire performance of this system and capability for practical application, and the new camera system equipped in situ image sensor with the signal accumulation function will be introduced.

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