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Matsumoto, Yoshihiro; Entani, Shiro; Koide, Akihiro*; Otomo, Manabu; Avramov, P.; Naramoto, Hiroshi*; Amemiya, Kenta*; Fujikawa, Takashi*; Sakai, Seiji
Journal of Materials Chemistry C, 1(35), p.5533 - 5537, 2013/09
Times Cited Count:32 Percentile:76.07(Materials Science, Multidisciplinary)Proessdorf, A.*; Rodenbach, P.*; Grosse, F.*; Hanke, M.*; Braun, W.*; Riechert, H.*; Hu, W.; Fujikawa, Seiji*; Kozu, Miwa; Takahashi, Masamitsu
Surface Science, 606(17-18), p.1458 - 1461, 2012/09
Times Cited Count:1 Percentile:4.59(Chemistry, Physical)Hojo, Ikuko*; Koide, Akihiro*; Matsumoto, Yoshihiro; Maruyama, Takashi*; Nagamatsu, Shinichi*; Entani, Shiro; Sakai, Seiji; Fujikawa, Takashi*
Journal of Electron Spectroscopy and Related Phenomena, 185(1-2), p.32 - 38, 2012/03
Times Cited Count:1 Percentile:6.91(Spectroscopy)Sasaki, Takuo*; Suzuki, Hidetoshi*; Sai, Akihisa*; Takahashi, Masamitsu; Fujikawa, Seiji; Kamiya, Itaru*; Oshita, Yoshio*; Yamaguchi, Masafumi*
Journal of Crystal Growth, 323(1), p.13 - 16, 2011/05
Times Cited Count:20 Percentile:82.65(Crystallography)Growth temperature dependence of strain relaxation during InGaAs/GaAs(001) molecular beam epitaxy was studied by in situ X-ray reciprocal space mapping. Evolution of the residual strain and crystal quality for the InGaAs film was obtained as a function of film thickness at growth temperatures of 420, 445 and 477 C. In the early stages of strain relaxation, it was found that evolution of the residual strain and crystal quality was dependent on the growth temperature. In order to discuss this observation quantitatively, the strain relaxation model was proposed based on the Dodson-Tsao kinetic model, and its validity was demonstrated by good agreement with the experimental residual strain. Additionally, rate coefficients reflecting dislocation motions during strain relaxation were obtained as a function of growth temperature and strain relaxation was discussed in terms of the thermally active dislocation motion.
Hojo, Ikuko*; Matsumoto, Yoshihiro; Maruyama, Takashi*; Nagamatsu, Shinichi*; Entani, Shiro; Sakai, Seiji; Konishi, Takehisa*; Fujikawa, Takashi*
Photon Factory News, 29(1), p.20 - 25, 2011/05
no abstracts in English
Takahashi, Masamitsu; Fujikawa, Seiji
Japanese Journal of Applied Physics, 50(4), p.04DH06_1 - 04DH06_5, 2011/04
Times Cited Count:5 Percentile:22.94(Physics, Applied)Konishi, Tomoya*; Nishiwaki, Nagatoshi*; Tojo, Takashi*; Ishikawa, Takuma*; Teraoka, Teruki*; Ueta, Yukiko*; Kihara, Yoshifumi*; Moritoki, Hideji*; Tono, Tatsuo*; Musashi, Mio*; et al.
Physica Status Solidi (C), 8(2), p.405 - 407, 2011/02
Times Cited Count:3 Percentile:74.28(Engineering, Electrical & Electronic)Kakuda, Naoki*; Kaizu, Toshiyuki*; Takahashi, Masamitsu; Fujikawa, Seiji; Yamaguchi, Koichi*
Japanese Journal of Applied Physics, 49(9), p.095602_1 - 095602_4, 2010/09
Times Cited Count:4 Percentile:18.94(Physics, Applied)Suzuki, Hidetoshi*; Sasaki, Takuo*; Sai, Akihisa*; Oshita, Yoshio*; Kamiya, Itaru*; Yamaguchi, Masafumi*; Takahashi, Masamitsu; Fujikawa, Seiji
Applied Physics Letters, 97(4), p.041906_1 - 041906_3, 2010/07
Times Cited Count:32 Percentile:74.42(Physics, Applied)Sasaki, Takuo*; Suzuki, Hidetoshi*; Sai, Akihisa*; Takahashi, Masamitsu; Fujikawa, Seiji; Oshita, Yoshio*; Yamaguchi, Masafumi*
Materials Research Society Symposium Proceedings, Vol.1268, 6 Pages, 2010/05
Times Cited Count:0 Percentile:0.00(Materials Science, Multidisciplinary)Sasaki, Takuo*; Suzuki, Hidetoshi*; Sai, Akihisa*; Lee, J.-H.*; Takahashi, Masamitsu; Fujikawa, Seiji; Arafune, Koji*; Kamiya, Itaru*; Oshita, Yoshio*; Yamaguchi, Masafumi*
Applied Physics Express, 2, p.085501_1 - 085501_3, 2009/07
Times Cited Count:35 Percentile:76.10(Physics, Applied)Matsumoto, Yoshihiro; Sakai, Seiji; Entani, Shiro; Nagamatsu, Shinichi*; Hojo, Ikuko*; Fujikawa, Takashi*; Shimada, Toshihiro*; Naramoto, Hiroshi*; Maeda, Yoshihito; Yokoyama, Toshihiko*
no journal, ,
no abstracts in English
Fujikawa, Seiji; Kawamura, Tomoaki*; Bhunia, S.*; Watanabe, Yoshio*
no journal, ,
Growth mechanism of InP(001) of metalorganic chemical vapor deposition has been studied by X-ray reflectivity and grazing incidence X-ray diffraction (GIXD). The changes of reflectivity signal suggested that growth mode depended on substrate temperature, and particularly the step-flow growth mode was dominant at more than 550C. Monitoring the fractional-order reflection of (21)-InP(001) using GIXD during the step-flow growth, the changes of fractional-order reflection suggested that indium atom migrate on the substrate surface more than 1 minute during the growth.
Matsumoto, Yoshihiro; Entani, Shiro; Naramoto, Hiroshi*; Sakai, Seiji; Shimada, Toshihiro*; Yokoyama, Toshihiko*; Fujikawa, Takashi*
no journal, ,
no abstracts in English
Fujikawa, Seiji; Takahashi, Masamitsu
no journal, ,
In this work, we evaluated Fe films on GaAs(001) and InAs(001) by in-situ X-ray diffraction measurements with increasing Fe thickness. While the Fe film on InAs(001) was strained even at 30 ML, Fe on GaAs(001) was already relaxed at 4 ML with FeGaAs2 diffraction. While the increase of FeGaAs2 intensity shows down at 12 ML, The intensity of Fe 020 increasingly rises. These results suggest that interfacial FeGaAs22 on GaAs(001) facilitate the strain relief of Fe/GaAs(001).
Takahashi, Masamitsu; Fujikawa, Seiji*; Hu, W.; Tajiri, Hiroo*
no journal, ,
Absorption of hydrogen into a substrate begins with dissociated adsorption of hydrogen molecules. The mechanism of the transition from adsorption to absorption is an important knowledge for improving the performance of hydrogen storage materials. The aim of the present study is to verify the hydrogen absorption model in atomic scale through quantitative determination of structures of hydrogen-adsorbed Pd(110) by synchrotron X-ray diffraction. Experiments were performed at a synchrotron beamline 13XU at SPring-8 using a surface X-ray diffractometer integrated with a UHV chamber equipped with a cryostat. We measured five crystal truncation rod (CTR) profiles with increasing substrate temperature to room temperature from 57 K after the substrate was exposed to 10 Torr s hydrogen. Results show an atomic-scale picture that explains how adsorbed hydrogen is absorbed into the Pd bulk.
Takahashi, Masamitsu; Fujikawa, Seiji*; Hu, W.; Tajiri, Hiroo*
no journal, ,
no abstracts in English
Otomo, Manabu; Matsumoto, Yoshihiro; Yamamura, Noyuri*; Entani, Shiro; Avramov, P.; Naramoto, Hiroshi*; Amemiya, Kenta*; Fujikawa, Takashi*; Sakai, Seiji
no journal, ,
Graphene has been intensively studied in the last few years for its long spin coherent length. The performance of graphene spintronic devices, however, are strongly influenced by poor spin injection efficiency at graphene/ferromagnetic metal (FM) interface. A promising solution for improving spin injection efficiency is to insert a tunnel barrier between graphene and FM. In this study, we propose hexagonal boron nitride (h-BN) as a novel tunnel barrier for graphene spintronics. It was revealed that the N K-edge and B K-edge absorptions exhibit XMCD signals in response to the Ni magnetization. It was also found that the smaller incidence angle between the Ni magnetization and the X-ray propagation direction leads to larger XMCD signals. The nature of the spin polarization was discussed in connection with the energy and angle dependences of the XMCD signals, and contribution from magnetized Nickel atoms was proposed.
Sakai, Seiji; Matsumoto, Yoshihiro; Otomo, Manabu; Entani, Shiro; Avramov, P.; Naramoto, Hiroshi*; Fujikawa, Takashi*
no journal, ,