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Kameya, Hiromi*; Kikuchi, Masahiro; Todoriki, Setsuko*; Furuta, Masakazu*; Kobayashi, Yasuhiko; Hara, Hideyuki*; Shimoyama, Yuhei; Ukai, Mitsuko*
Shokuhin Shosha, 47(1), p.6 - 10, 2012/09
no abstracts in English
-irradiated black pepper using pulsed EPR spectroscopyKameya, Hiromi*; Kikuchi, Masahiro; Hara, Hideyuki*; Furuta, Masakazu*; Todoriki, Setsuko*; Kobayashi, Yasuhiko; Ukai, Mitsuko*; Shimoyama, Yuhei
Applied Magnetic Resonance, 42(2), p.153 - 159, 2012/03
Times Cited Count：5 Percentile：30.75(Physics, Atomic, Molecular & Chemical)no abstracts in English
Kamiya, Tomihiro; Takano, Katsuyoshi; Ishii, Yasuyuki; Sato, Takahiro; Oikawa, Masakazu*; Okubo, Takeru; Haga, Junji*; Nishikawa, Hiroyuki*; Furuta, Yusuke*; Uchiya, Naoyuki*; et al.
Nuclear Instruments and Methods in Physics Research B, 267(12-13), p.2317 - 2320, 2009/06
Times Cited Count：7 Percentile：47.15(Instruments & Instrumentation)Kamiya, Tomihiro; Nishikawa, Hiroyuki*; Sato, Takahiro; Haga, Junji; Oikawa, Masakazu*; Ishii, Yasuyuki; Okubo, Takeru; Uchiya, Naoyuki; Furuta, Yusuke*
Applied Radiation and Isotopes, 67(3), p.488 - 491, 2009/03
Times Cited Count：4 Percentile：30.49(Chemistry, Inorganic & Nuclear)Development of a mask-less ion beam lithography technique for fabricating micro- or nano-meter sized structures has been started at the microbeam systems in the ion accelerator facility of JAEA Takasaki (TIARA) in collaboration with Shibaura Institute of Technology. In order to obtain a high precision measure for microbeam size estimation and lens system optimization, or for improvement of spatial resolution down to 100 nm level, we applied this lithography technique itself combined with the electroplating process to make a Ni relief pattern as an optimum resolution standard to be used in secondary electron imaging. In this work, using this standard, the smallest beam size could be obtained. This paper also discuses on the scattering of ions in the materials influenced to the resolution using a Monte Carlo simulation code.
Kume, Tamikazu*; Furuta, Masakazu*; Todoriki, Setsuko*; Uenoyama, Naoki*; Kobayashi, Yasuhiko
Radiation Physics and Chemistry, 78(3), p.222 - 226, 2009/03
Times Cited Count：132 Percentile：99.42(Chemistry, Physical)Kume, Tamikazu*; Furuta, Masakazu*; Todoriki, Setsuko*; Uenoyama, Naoki*; Kobayashi, Yasuhiko
Radioisotopes, 58(1), p.25 - 35, 2009/01
Uchiya, Naoyuki*; Furuta, Yusuke*; Nishikawa, Hiroyuki*; Watanabe, Toru*; Haga, Junji; Sato, Takahiro; Oikawa, Masakazu; Ishii, Yasuyuki; Kamiya, Tomihiro
Microsystem Technologies, 14(9-11), p.1537 - 1540, 2008/10
Times Cited Count：17 Percentile：64.34(Engineering, Electrical & Electronic)Nishitani, Tomohiro; Nakanishi, Tsutomu*; Yamamoto, Masahiro*; Okumi, Shoji*; Furuta, Fumio*; Miyamoto, Masaharu*; Kuwahara, Makoto*; Yamamoto, Naoto*; Naniwa, Kenichi*; Watanabe, Osamu*; et al.
Journal of Applied Physics, 97(9), p.094907_1 - 094907_6, 2005/05
Times Cited Count：64 Percentile：87.31(Physics, Applied)no abstracts in English
Hayashi, Hirotaka; Narumi, Issei; Wada, Seiichi; Kikuchi, Masahiro; Furuta, Masakazu*; Uehara, Kaku*; Watanabe, Hiroshi*
Journal of Plant Physiology, 161(10), p.1101 - 1106, 2004/10
Times Cited Count：10 Percentile：23.18(Plant Sciences)The resistance of strains Z (wild type) and SM-ZK (chloroplast-deficient mutant) to ionizing radiation was investigated. The colony forming ability of 
strain Z was higher than that of strain SM-ZK after -irradiation. For both strains, the resistance of light-grown cells was higher than that of dark-grown cells, suggesting that the light conditions during the culture contribute to the radiation resistance of . The comet assay showed that the ability of rejoining DNA double-strand breaks (dsb) was much higher in the light-grown cells. These results suggest that possesses a light-induced repair system to cope with DNA dsb.
to ion beam radiationHayashi, Hirotaka*; Wada, Seiichi; Funayama, Tomoo; Narumi, Issei; Kobayashi, Yasuhiko; Watanabe, Hiroshi*; Furuta, Masakazu*; Uehara, Kaku*
Journal of Eukaryotic Microbiology, 51(3), p.321 - 324, 2004/06
Times Cited Count：5 Percentile：6.62(Microbiology)no abstracts in English
Furuta, Yusuke*; Uchiya, Naoyuki*; Nishikawa, Hiroyuki*; Haga, Junji; Oikawa, Masakazu*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro
no journal, ,
no abstracts in English
Uchiya, Naoyuki; Furuta, Yusuke*; Nishikawa, Hiroyuki*; Haga, Junji; Sato, Takahiro; Oikawa, Masakazu*; Okubo, Takeru; Ishii, Yasuyuki; Kamiya, Tomihiro; Yamamoto, Shunya
no journal, ,
no abstracts in English
