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Journal Articles

Ionoluminescence analysis of glass scintillators and application to single-ion-hit real-time detection

Yokoyama, Akihito; Kada, Wataru*; Sato, Takahiro; Koka, Masashi; Shimada, Keisuke*; Yokota, Yuya*; Miura, Kenta*; Hanaizumi, Osamu*

Nuclear Instruments and Methods in Physics Research B, 371, p.340 - 343, 2016/03

 Times Cited Count:6 Percentile:45.92(Instruments & Instrumentation)

no abstracts in English

Journal Articles

New application of NV centers in CVD diamonds as a fluorescent nuclear track detector

Onoda, Shinobu; Haruyama, Moriyoshi; Teraji, Tokuyuki*; Isoya, Junichi*; Kada, Wataru*; Hanaizumi, Osamu*; Oshima, Takeshi

Physica Status Solidi (A), 212(11), p.2641 - 2644, 2015/11

 Times Cited Count:12 Percentile:45.41(Materials Science, Multidisciplinary)

Journal Articles

NV centers in diamond used for detection of single ion track

Haruyama, Moriyoshi; Onoda, Shinobu; Kada, Wataru*; Teraji, Tokuyuki*; Isoya, Junichi*; Oshima, Takeshi; Hanaizumi, Osamu*

Proceedings of 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-11) (Internet), p.184 - 187, 2015/11

Journal Articles

Fabrication of microstructures embedded in SC-CVD diamond with a focused proton microbeam

Kada, Wataru*; Kambayashi, Yuya*; Miura, Kenta*; Saruya, Ryota*; Kubota, Atsushi*; Sato, Takahiro; Koka, Masashi; Kamiya, Tomihiro; Hanaizumi, Osamu*

Key Engineering Materials, 643, p.15 - 19, 2015/05

Journal Articles

Development of diagnostic method for deep levels in semiconductors using charge induced by heavy ion microbeams

Kada, Wataru*; Kambayashi, Yuya*; Iwamoto, Naoya*; Onoda, Shinobu; Makino, Takahiro; Koka, Masashi; Kamiya, Tomihiro; Hoshino, Norihiro*; Tsuchida, Hidekazu*; Kojima, Kazutoshi*; et al.

Nuclear Instruments and Methods in Physics Research B, 348, p.240 - 245, 2015/04

 Times Cited Count:4 Percentile:30.80(Instruments & Instrumentation)

Journal Articles

Development of embedded Mach-Zehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing

Kada, Wataru*; Miura, Kenta*; Kato, Hijiri*; Saruya, Ryota*; Kubota, Atsushi*; Sato, Takahiro; Koka, Masashi; Ishii, Yasuyuki; Kamiya, Tomihiro; Nishikawa, Hiroyuki*; et al.

Nuclear Instruments and Methods in Physics Research B, 348, p.218 - 222, 2015/04

 Times Cited Count:8 Percentile:52.78(Instruments & Instrumentation)

Journal Articles

Mach-Zehnder polymer waveguides fabricated using proton beam writing

Miura, Kenta*; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; Kiryu, Hiromu*; Ozawa, Yusuke*; Takano, Katsuyoshi*; Okubo, Takeru; Yamazaki, Akiyoshi; Kada, Wataru; et al.

JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 126, 2013/01

Journal Articles

Fabrication of Mach-Zehnder polimer waveguides by a direct-drawing technique using a focused proton beam

Miura, Kenta*; Sato, Takahiro; Ishii, Yasuyuki; Kiryu, Hiromu*; Ozawa, Yusuke*; Koka, Masashi; Takano, Katsuyoshi*; Okubo, Takeru; Yamazaki, Akiyoshi; Kada, Wataru; et al.

Key Engineering Materials, 534, p.158 - 161, 2013/00

 Times Cited Count:5 Percentile:88.64(Nanoscience & Nanotechnology)

Journal Articles

Fabrication of Y-junction waveguides using proton beam writing

Miura, Kenta*; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; Uehara, Masato*; Kiryu, Hiromu*; Takano, Katsuyoshi*; Okubo, Takeru; Yamazaki, Akiyoshi; Kada, Wataru; et al.

JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 126, 2012/01

Journal Articles

Fabrication of polymer optical waveguides for the 1.5-$$mu$$m band using focused proton beam

Miura, Kenta*; Machida, Yuki*; Uehara, Masato*; Kiryu, Hiromu*; Ozawa, Yusuke*; Sasaki, Tomoyuki*; Hanaizumi, Osamu*; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; et al.

Key Engineering Materials, 497, p.147 - 150, 2012/00

 Times Cited Count:7 Percentile:94.42(Engineering, Electrical & Electronic)

Journal Articles

Fabrication of polymer optical waveguides for the 1.5-$$mu$$m band using focused proton beam

Miura, Kenta*; Machida, Yuki*; Uehara, Masato*; Kiryu, Hiromu*; Ozawa, Yusuke*; Sasaki, Tomoyuki*; Hanaizumi, Osamu*; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; et al.

Key Engineering Materials, 497, p.147 - 150, 2011/12

 Times Cited Count:6 Percentile:2.48

Journal Articles

Design and fabrication of novel photonic crystal waveguide consisting of Si-ion implanted SiO$$_{2}$$ layers

Umenyi, A. V.*; Hommi, Masashi*; Kawashiri, Shinya*; Shinagawa, Teruyoshi*; Miura, Kenta*; Hanaizumi, Osamu*; Yamamoto, Shunya; Inoue, Aichi; Yoshikawa, Masahito

Key Engineering Materials, 459, p.168 - 172, 2011/04

A new type of two-dimensional photonic crystal (2-D PhC) waveguide was designed using finite difference time domain method to operate at a wavelength of 1.55 $$mu$$m applicable to optical fiber-communication systems. We estimated that a triangular-lattice 2-D PhC structure formed by air holes with a diameter of 465 nm and a period of 664 nm suit our purpose. To form a core of the waveguide, Si ions were implanted into a SiO$$_{2}$$ layer by using a 400-kV ion implanter. The implantation energy was 80 keV and the implantation amount was 1$$times$$10$$^{17}$$ ions/cm$$^{2}$$. The electron beam resist was spin-coated on a substrate and the designed pattern was written lithographically in the resist using Electron Beam. Atomic force microscope measurements revealed that the diameter and the period of air holes of the waveguide were 466 and 666 nm. These values were nearly equal to the designed ones. We thus succeeded in fabricating 2-D PhC waveguides in a Si-ion-implanted SiO$$_{2}$$ layer.

Oral presentation

Fundamental study of fabrication of a light waveguide using proton beam writing

Miura, Kenta*; Sato, Takahiro; Koka, Masashi; Ishii, Yasuyuki; Takano, Katsuyoshi; Kada, Wataru; Yamazaki, Akiyoshi; Yokoyama, Akihito; Kamiya, Tomihiro; Uehara, Masato*; et al.

no journal, , 

no abstracts in English

Oral presentation

Single-mode PMMA waveguides for the 1.5-$$mu$$m wavelength range fabricated by proton beam writing

Miura, Kenta*; Machida, Yuki*; Uehara, Masato*; Hanaizumi, Osamu*; Ishii, Yasuyuki; Sato, Takahiro; Takano, Katsuyoshi; Okubo, Takeru; Yamazaki, Akiyoshi; Inoue, Aichi; et al.

no journal, , 

no abstracts in English

Oral presentation

Fabrication and evaluation of light-emitting SiO$$_{2}$$ substrates implanted with Ge ions

Shinagawa, Teruyoshi*; Umenyi, A. V.*; Kikuchi, Shusuke*; Aiba, Mizuki*; Inada, Kazuki*; Miura, Kenta*; Hanaizumi, Osamu*; Yamamoto, Shunya; Kawaguchi, Kazuhiro; Yoshikawa, Masahito

no journal, , 

Light emission between ultraviolet and blue from SiO$$_{2}$$ substrates implanted with Ge ions in comparatively shallow depth ($$sim$$100 nm) has been reported. In this paper, we report the photoluminescence (PL) properties of SiO$$_{2}$$ substrates implanted with Ge ions deeper than previous works ($$sim$$200 nm depth) in order to enlarge the spot size of the photonic crystals waveguides. Ge ions were implanted into an SiO$$_{2}$$ substrate with 350 keV, and the implantation amount was 1$$times$$10$$^{17}$$ ions/cm$$^{2}$$. PL peaks around a wavelength of 400 nm were observed. Stronger PL peaks were measured after annealing (900 $$^{circ}$$C), which confirmed an effect of improving the emission intensity by the annealing process. Though Ge ions were implanted more deeply than the earlier reported depth, similar results were confirmed. The expectation for a new light-emitting waveguide device that combines Ge-ion-implanted SiO$$_{2}$$ substrates with photonic crystal characteristics has risen.

Oral presentation

Fabrication of UV light-emitting fused-silica substrates by Si-ion implantation and increase of light-emitting intensity by thermal annealing

Miura, Kenta*; Hommi, Masashi*; Hanaizumi, Osamu*; Yamamoto, Shunya; Sugimoto, Masaki; Yoshikawa, Masahito; Inoue, Aichi

no journal, , 

no abstracts in English

Oral presentation

Fabrication of PMMA waveguides for the 1.5-$$mu$$-wavelength range by using proton beam writing, 2

Miura, Kenta*; Machida, Yuki*; Uehara, Masato*; Hanaizumi, Osamu*; Ishii, Yasuyuki; Sato, Takahiro; Takano, Katsuyoshi; Okubo, Takeru; Yamazaki, Akiyoshi; Inoue, Aichi; et al.

no journal, , 

no abstracts in English

Oral presentation

Blue-light emission from silica substrates implanted Si ions

Miura, Kenta*; Tanemura, Tsuyoshi*; Hommi, Masashi*; Hanaizumi, Osamu*; Yamamoto, Shunya; Takano, Katsuyoshi; Sugimoto, Masaki; Yoshikawa, Masahito

no journal, , 

no abstracts in English

Oral presentation

Development of embeded Mach-Zender waveguide using substrate of PDMS

Miura, Kenta*; Kada, Wataru*; Saruya, Ryota*; Hanaizumi, Osamu*; Ishii, Yasuyuki; Koka, Masashi; Yokoyama, Akihito; Sato, Takahiro; Kamiya, Tomihiro

no journal, , 

no abstracts in English

Oral presentation

Photoluminescence properties of light-emitting SiO$$_{2}$$ substrates implanted with Si and C ions

Inada, Kazuki*; Kawashima, Akihiro*; Kano, Keisuke*; Noguchi, Katsuya*; Miura, Kenta*; Hanaizumi, Osamu*; Yamamoto, Shunya; Kawaguchi, Kazuhiro*; Yoshikawa, Masahito

no journal, , 

It is reported that Si and C ions implanted SiO$$_{2}$$ substrates emit blue light. In this paper, we are studying photoluminescence (PL) properties of SiO$$_{2}$$ substrates implanted with Si and C ions on various conditions. Si and C ions were implanted into an SiO$$_{2}$$ substrate by using a 400-kV ion implanter at JAEA/Takasaki. The Si-ion implantation energy was 150 keV, and the implantation dose was $$sim$$5.0$$times$$10$$^{16}$$ ions/cm$$^{2}$$. The C-ion implantation energy was 75 keV, and the implantation dose was $$sim$$3.0$$times$$10$$^{16}$$ ions/cm$$^{2}$$. The samples were subsequently annealed at 700$$^{circ}$$C for 25 min in air, after 1000$$^{circ}$$C for 25 min in air. The results of PL measurements show that the PL peak wavelength became shorter by increasing the ratio of C ions to Si ions. Consequently, it was confirmed that the emission wavelength can be controlled by hanging the ratio of C and Si.

53 (Records 1-20 displayed on this page)