Radiation response of silicon carbide metal-oxide-semiconductor transistors in high dose region

Oshima, Takeshi; Yokoseki, Takashi; Murata, Koichi; Matsuda, Takuma; Mitomo, Satoshi; Abe, Hiroshi; Makino, Takahiro; Onoda, Shinobu; Hijikata, Yasuto*; Tanaka, Yuki*; et al.

Japanese Journal of Applied Physics, 55(1S), p.01AD01_1 - 01AD01_4, 2016/01

https://doi.org/10.7567/JJAP.55.01AD01

A Development of super radiation-hardened power electronics using silicon carbide semiconductors; Toward MGy-class radiation resistivity

Hijikata, Yasuto*; Mitomo, Satoshi*; Matsuda, Takuma*; Murata, Koichi*; Yokoseki, Takashi*; Makino, Takahiro; Takeyama, Akinori; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; et al.

Proceedings of 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-11) (Internet), p.130 - 133, 2015/11

Electrical characteristics of interface defects in oxides grown at 1200 C in dry oxygen ambient on silicon carbide and their thermal annealing effects

Yoshikawa, Masahito; Ishida, Yuki*; Jikimoto, Tamotsu*; Hijikata, Yasuto*; Ito, Hisayoshi; Okumura, Hajime*; Takahashi, Tetsuo*; Tsuchida, Hidekazu*; Yoshida, Sadafumi*

Denshi Joho Tsushin Gakkai Rombunshi, C, 86(4), p.426 - 433, 2003/04

https://ci.nii.ac.jp/naid/110003172129

no abstracts in English

Measurements of the depth profile of the refractive indices in oxide films on SiC by spectroscopic ellipsometry

Iida, Takeshi*; Tomioka, Yuichi*; Yoshimoto, Kimihiro*; Midorikawa, Masahiko*; Tsukada, Hiroyuki*; Orihara, Misao*; Hijikata, Yasuto*; Yaguchi, Hiroyuki*; Yoshikawa, Masahito; Ito, Hisayoshi; et al.

Japanese Journal of Applied Physics, Part 1, 41(2A), p.800 - 804, 2002/02

https://doi.org/10.1143/JJAP.41.800

no abstracts in English

The Investigation of 4H-SiC/SiO interfaces by optical and electrical measurements

Ishida, Yuki*; Takahashi, Tetsuo*; Okumura, Hajime*; Jikimoto, Tamotsu*; Tsuchida, Hidekazu*; Yoshikawa, Masahito; Tomioka, Yuichi*; Midorikawa, Masahiko*; Hijikata, Yasuto*; Yoshida, Sadafumi*

Materials Science Forum, 389-393, p.1013 - 1016, 2002/00

https://doi.org/10.4028/www.scientific.net/MSF.389-393.1013

no abstracts in English

Impact on I-V characteristics of Si- and SiC-MOSFETs caused by ray

Yokoseki, Takashi; Tanaka, Kazuya; Fujita, Natsuko; Makino, Takahiro; Onoda, Shinobu; Oshima, Takeshi; Tanaka, Yuki*; Kandori, Mikio*; Yoshie, Toru*; Hijikata, Yasuto*

no journal, , 

no abstracts in English

Change in electrical properties SiC-MOS capacitor and PiN diode after ray irradiation

Tanaka, Kazuya*; Yokoseki, Takashi*; Fujita, Natsuko; Iwamoto, Naoya; Makino, Takahiro; Onoda, Shinobu; Oshima, Takeshi; Tanaka, Yuki*; Kandori, Mikio*; Yoshie, Toru*; et al.

no journal, , 

no abstracts in English

The Electrical characteristics of SiC-MOSFETs irradiated with -rays at elevated temperature

Matsuda, Takuma; Yokoseki, Takashi; Mitomo, Satoshi; Murata, Koichi; Makino, Takahiro; Abe, Hiroshi; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

no abstracts in English

-ray irradiation response of silicon carbide semiconductor devices; Extremely high radiation resistance

Sato, Shinichiro; Onoda, Shinobu; Makino, Takahiro; Fujita, Natsuko; Oshima, Takeshi; Yokoseki, Takashi*; Tanaka, Kazuya*; Hijikata, Yasuto*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

We investigate the threshold voltage shift of Si-MOSFETs, SiC-MOSFETs, SiC-MESFETs, and SiC SITs (Static Induction Transistors) due to irradiation. As a result, no significant threshold voltage shift was observed up to the absorbed dose of 10 Gy in all the SiC transistors, whereas the serious degradation was observed in the Si-MOSFETs. This strongly indicates that radiation resistance of SiC-MOSFETs and the other SiC-transistors is far superior to that of Si-MOSFETs. The radiation resistance of SiC-MOSFETs fabricated by pyrogenic oxidation is higher than that of the SiC-MOSFETs fabricated by dry oxidation. This result reflects that radiation resistance of SiC-MOSFETs strongly depends on the gate oxidation process since the formed oxide layers have different properties. Also, radiation resistance of SiC-SITs and SiC MESFETs is higher than that of SiC-MOSFETs, since SITs and MESFETs do not have gate oxide layer.

Recovery of the degraded characteristics of SiC MOSFETs irradiated with -rays by thermal treatments

Yokoseki, Takashi; Abe, Hiroshi; Makino, Takahiro; Onoda, Shinobu; Tanaka, Yuki*; Kandori, Mikio*; Yoshie, Toru*; Hijikata, Yasuto*; Oshima, Takeshi

no journal, , 

no abstracts in English