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Nishikino, Masaharu; Ishino, Masahiko; Ichimaru, Satoshi*; Hatayama, Masatoshi*; Hasegawa, Noboru; Kawachi, Tetsuya
Reza Gakkai Dai-483-Kai Kenkyukai Hokoku; Tanhacho Ryoshi Bimu Hassei To Sono Oyo, p.25 - 28, 2015/12
X-ray ablation has been recently achieved using plasma soft X-ray lasers (SXRLs), laser plasma soft X-rays, and X-ray free electron lasers. In order to study the interactions between picosecond SXRL beams and material and multi-layered structure surfaces were irradiated with SXRL pulse. Following irradiation, the substrate surface was observed using a scanning electron microscope and an atomic force microscope. The surface modifications caused by the SXRL beam were clearly seen. The multi-layered mirror is the important component for the EUV lithography. Then, we have started the damage test of multi-layered structure, and the surface modifications caused by the SXRL pulse irradiations were confirmed.
Ichimaru, Satoshi*; Takenaka, Hisataka*; Namikawa, Kazumichi*; Gullikson, E. M.*; Maruyama, Momoko; Oku, Satoshi*
Review of Scientific Instruments, 86(9), p.093106_1 - 093106_7, 2015/09
Times Cited Count：3 Percentile：14.95(Instruments & Instrumentation)A graded and broadband Mo/Si multilayer mirror for EUV spectroscopy is demonstrated. This mirror has an average reflectivity profile of 16% in the wavelength region from 15 nm to 17 nm and an effective area of 1100 - 1500 mm
. This reflectivity is about 4 times larger than that of a standard Mo/Si multilayer mirror on a 1 in. diameter substrate, showing that the mirror can be used for measuring EUV fluorescence at wavelengths in the region around 15 nm to 17 nm.
