Refine your search:     
Report No.
 - 
Search Results: Records 1-2 displayed on this page of 2
  • 1

Presentation/Publication Type

Initialising ...

Refine

Journal/Book Title

Initialising ...

Meeting title

Initialising ...

First Author

Initialising ...

Keyword

Initialising ...

Language

Initialising ...

Publication Year

Initialising ...

Held year of conference

Initialising ...

Save select records

Journal Articles

Radiation-induced reaction of sulfonamide-containing polymers in the film state for color imaging

Maekawa, Yasunari; Kato, Jun*; Katakai, Masashi*; Ishihara, Masaaki*; Enomoto, Kazuyuki; Hagiwara, Tokio*; Ishii, Tatsuhito*; Ito, Kazuo*; Koshikawa, Hiroshi; Yoshida, Masaru

Macromolecular Chemistry and Physics, 209(6), p.625 - 633, 2008/03

 Times Cited Count:2 Percentile:7.34(Polymer Science)

A polysulfonamide and copolymers consisting of sulfonamides and amides underwent Fries rearrangement and scission, forming amino groups upon EB irradiation. The EB irradiation of these films with a dose of 500 $$mu$$C/cm$$^{-2}$$ followed by the color forming reaction provided the color imaging of line/space patterns with resolution of 300 nm.

Journal Articles

Refractive index change and color imaging of acid-chromic polymer films using EB-induced acid generation

Kato, Jun; Yuasa, Kanako; Matsushita, Harumi*; Maekawa, Yasunari; Enomoto, Kazuyuki; Ishii, Tatsuhito*; Ito, Kazuo*; Yamashita, Takashi*

Journal of Photopolymer Science and Technology, 19(1), p.105 - 110, 2006/00

 Times Cited Count:2 Percentile:6.5(Polymer Science)

The novel electron beam (EB)-induced color imaging system, consisting of polymer films with acid-responsive chromic molecules (chromic dyes) and EB-acid generators (EBAGs) was proposed. EB irradiation of the acid-chromic polymer films induced acid generation from EBAG, resulting in color formation of the acid-chromic molecules (protonated forms). Nanoscale color imaging on the acid- chromic polymer films was carried out using EB scanning direct drawing. Clear color imaging of 200 nm square and 100 nm line/space patterns could be observed with a dose of only 50 $$mu$$C cm$$^{-2}$$. Furthermore, the large EB-induced refractive index change of these films (0.013 at 632.8 nm) was observed in both TE and TM modes by an m-line method, which is sufficient to create an optical circuit.

2 (Records 1-2 displayed on this page)
  • 1