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Journal Articles

Characterization of monolayer oxide formation processes on high-index Si surface by photoelectron spectroscopy with synchrotron radiation

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

Applied Physics Express, 6(11), p.115701_1 - 115701_4, 2013/11

 Times Cited Count:3 Percentile:15.85(Physics, Applied)

Oral presentation

Analysis of initial oxidation process of high-index Si surfaces using supersonic molecular beam

Ono, Shinya*; Inoue, Kei*; Momose, Tatsuya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, , 

no abstracts in English

Oral presentation

Analysis of plane direction dependence for Si initial oxidation reactions induced by supersonic molecular beams

Ono, Shinya*; Inoue, Kei*; Momose, Tatsuya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, , 

no abstracts in English

Oral presentation

Analysis of temperature dependence in thermal oxidation process on high-index Si surfaces

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, , 

no abstracts in English

Oral presentation

Analysis of initial oxidation process of high-index Si surfaces using supersonic molecular beam, 2

Ono, Shinya*; Kanemura, Rui*; Abe, Sosuke*; Inoue, Kei*; Momose, Tatsuya*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, , 

no abstracts in English

Oral presentation

Real-time observation of thermal oxidation process on high-index silicon surfaces by means of photoemission spectroscopy with synchrotron radiation

Ono, Shinya*; Abe, Sosuke*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, , 

Oral presentation

Analysis of temperature dependence in thermal oxidation process on high-index Si surfaces, 2

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, , 

no abstracts in English

Oral presentation

Interface structures and electronic states of Si$$_{2}$$/Si in oxidation processes of Si high index surfaces

Abe, Sosuke*; Ono, Shinya*; Kanemura, Rui*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no journal, , 

no abstracts in English

Oral presentation

Investigation of the difference between thermal oxidation and supersonic molecular beam induced oxidation on Si(113)

Ono, Shinya*; Abe, Sosuke*; Kanemura, Rui*; Miura, Shu*; Narishige, Takuma*; Inoue, Kei*; Momose, Tatsuya*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; et al.

no journal, , 

no abstracts in English

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