Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Takei, Satoshi*; Oshima, Akihiro*; Oyama, Tomoko; Ito, Kenta*; Sugahara, Kigen*; Kashiwakura, Miki*; Kozawa, Takahiro*; Tagawa, Seiichi*; Hanabata, Makoto*
Japanese Journal of Applied Physics, 53(11), p.116505_1 - 116505_7, 2014/11
Times Cited Count：10 Percentile：41.38(Physics, Applied)The application of natural linear polysaccharide to green resists was demonstrated for electron beam (EB) and extreme-ultraviolet (EUV) lithography. Because of the water solubility of natural polysaccharides, the water spin-coating and water-developable processes realize an environmentally friendly manufacturing process for next-generation electronic devices. The developed green resist with a weight-average molecular weight of 83,000 and 70 mol % hydroxyl groups was found to have acceptable properties such as spin-coat ability on 200 mm wafers, pillar patterns of 100-400 nm with a high EB sensitivity of 10 
C/cm
, etch selectivity with a silicon-based middle layer in CF
plasma treatment, and high prediction sensitivity to EUV region.
Takei, Satoshi*; Oshima, Akihiro*; Ichikawa, Takumi*; Sekiguchi, Atsushi*; Kashiwakura, Miki*; Kozawa, Takahiro*; Tagawa, Seiichi*; Oyama, Tomoko; Ito, Shoji*; Miyasaka, Hiroshi*
Microelectronic Engineering, 122, p.70 - 76, 2014/06
Times Cited Count：24 Percentile：76.82(Engineering, Electrical & Electronic)Biomass-derived branched sugar resist material was developed for environmentally-friendly electron beam lithography (EBL). The developed resist enables organic solvent-free water-developable process. The resist performance was evaluated using 75 keV EBL system. Lines of 50-200 nm were fabricated with high sensitivity of 7 C/cm. The resist is developable in pure water at 23 
C for 60 s, and it has acceptable CF etch selectivity.
