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Koike, Masato; Imazono, Takashi; Kawazoe, Tadashi*; Otsu, Motoichi*; Sano, Kazuo*
Denki Gakkai Hikari, Ryoshi Debaisu Kenkyukai Shiryo OQD-08-34, p.15 - 18, 2008/05
A Mo/SiO
multilayer laminar-type holographic grating having an average groove density of 2400 lines/mm is designed and fabricated for use with a soft X-ray flat field spectrograph. A varied-line-spaced grooves pattern is generated by the use of an aspheric wavefront recording system and laminar-type grooves are formed by a reactive ion-etching method. The measured first-order diffraction efficiency is 18
20%. The flat field spectrograph equipped with the grating indicates a spectral line width of 814 eV for the emission spectra generated from electron-impact X-ray sources. A Mo/SiO multilayer grating having a groove density of 7600 lines/mm fabricated by use of a new lithography machine based on optical near field technologies showed first-order diffraction efficiency of 3%. It is over one order magnitude higher than that of the other orders.
Koike, Masato; Kawazoe, Tadashi*; Imazono, Takashi; Miyauchi, Shinji*; Sano, Kazuo*; Otsu, Motoichi*
no journal, ,
Multilayer gratings having a groove density of 7600 lines/mm have been fabricated by depositing Mo/SiO multilayer coating on the surface of laminar-type master gratings fabricated by use of a new lithography machine based on optical near field technologies. The diffraction efficiency was measured by reflectometers in the wavelength range of 0.7-2.0 nm at a synchrotron radiation facility. The multilayer grating having a groove depth of 3nm and multilayer period length of 5.33 nm showed diffraction efficiencies of 0.028 at 0.70 nm and 0.005 at 2.0 nm were observed for the incidence angles of 88.020 deg and 80.764 deg, respectively. We also discuss the analysis of the roughness in terms of Debye-Waller factor comparing the experimental and theoretical diffraction efficiencies as well as the groove depth using experimental efficiency minima of the zero-th order light.