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Takahashi, Masamitsu; Kozu, Miwa*; Sasaki, Takuo
Japanese Journal of Applied Physics, 55(4S), p.04EJ04_1 - 04EJ04_4, 2016/04
Times Cited Count:5 Percentile:23.64(Physics, Applied)Takahashi, Masamitsu; Kozu, Miwa*; Sasaki, Takuo; Hu, W.*
Crystal Growth & Design, 15(10), p.4979 - 4985, 2015/10
Times Cited Count:14 Percentile:70.13(Chemistry, Multidisciplinary)Takahashi, Masamitsu; Nakata, Yuka*; Suzuki, Hidetoshi*; Ikeda, Kazuma*; Kozu, Miwa; Hu, W.; Oshita, Yoshio*
Journal of Crystal Growth, 378, p.34 - 36, 2013/09
Times Cited Count:5 Percentile:42.01(Crystallography)Hu, W.; Takahashi, Masamitsu; Kozu, Miwa*; Nakata, Yuka*
Journal of Physics; Conference Series, 425(20), p.202010_1 - 202010_4, 2013/03
Times Cited Count:1 Percentile:52.52(Instruments & Instrumentation)Hu, W.; Suzuki, Hidetoshi*; Sasaki, Takuo*; Kozu, Miwa*; Takahashi, Masamitsu
Journal of Applied Crystallography, 45(5), p.1046 - 1053, 2012/10
Times Cited Count:13 Percentile:73.09(Chemistry, Multidisciplinary)Proessdorf, A.*; Rodenbach, P.*; Grosse, F.*; Hanke, M.*; Braun, W.*; Riechert, H.*; Hu, W.; Fujikawa, Seiji*; Kozu, Miwa; Takahashi, Masamitsu
Surface Science, 606(17-18), p.1458 - 1461, 2012/09
Times Cited Count:1 Percentile:4.59(Chemistry, Physical)Krogstrup, P.*; Morten Hannibal, M.*; Hu, W.; Kozu, Miwa*; Nakata, Yuka*; Nygard, J.*; Takahashi, Masamitsu; Feidenhans'l, R.*
Applied Physics Letters, 100(9), p.093103_1 - 093103_4, 2012/02
Times Cited Count:43 Percentile:82.61(Physics, Applied)Sasaki, Takuo*; Suzuki, Hidetoshi*; Inagaki, Makoto*; Ikeda, Kazuma*; Shimomura, Kenichi*; Takahashi, Masamitsu; Kozu, Miwa*; Hu, W.; Kamiya, Itaru*; Oshita, Yoshio*; et al.
IEEE Journal of Photovoltaics, 2(1), p.35 - 40, 2012/01
Times Cited Count:5 Percentile:22.06(Energy & Fuels)Takahashi, Masamitsu; Kozu, Miwa; Hu, W.; Nakata, Yuka*
no journal, ,
no abstracts in English
Takahashi, Masamitsu; Kozu, Miwa*; Hu, W.*; Nakata, Yuka
no journal, ,
Takahashi, Masamitsu; Kozu, Miwa*; Hu, W.*
no journal, ,
Hu, W.; Takahashi, Masamitsu; Kozu, Miwa*; Suzuki, Hidetoshi*; Sasaki, Takuo*
no journal, ,
Hu, W.; Suzuki, Hidetoshi*; Sasaki, Takuo*; Kozu, Miwa*; Takahashi, Masamitsu
no journal, ,
Kozu, Miwa; Hu, W.; Nakata, Yuka*; Takahashi, Masamitsu
no journal, ,
Kozu, Miwa*; Hu, W.; Takahashi, Masamitsu
no journal, ,
no abstracts in English
Kozu, Miwa; Hu, W.; Nakata, Yuka*; Takahashi, Masamitsu
no journal, ,
no abstracts in English
Nakata, Yuka*; Suzuki, Hidetoshi*; Ikeda, Kazuma*; Hu, W.; Kozu, Miwa; Takahashi, Masamitsu; Oshita, Yoshio*
no journal, ,
Molecular-beam epitaxial growth processes of GaAs on Si(001) was investigated using in situ synchrotron X-ray diffraction. Three-dimensional X-ray intensity distribution around Si and GaAs 022 Bragg points in the reciprocal space was measured during growth by combination of an area detector and one-axis scan. At the initial stage of the growth, the average radius of GaAs islands, , and growth time, , were found to follow in accordance with the growth limited by the binding of Ga with As at step edges.
Hu, W.; Takahashi, Masamitsu; Kozu, Miwa*; Nakata, Yuka*
no journal, ,
Takahashi, Masamitsu; Kozu, Miwa*; Sasaki, Takuo
no journal, ,
Kozu, Miwa*; Hu, W.; Takahashi, Masamitsu
no journal, ,
Recently, low-dimensional structures of semiconductors have attracted much attention because of their possible novel functions originating from quantum size effects. It has been shown that free-standing semiconductor nanowires can be grown on the (111) surface of silicon and the (111)B surface of III-V semiconductors by the vapor-liquid-solid growth technique in which metal particles, such as Au, Ni and Fe, serve as catalysts. Semiconductor nanowires of GaAs and InAs are known to adopt the wurtzite structure rather than than zincblende structure which is the normal structure in their bulk crystals. In the present study, we have performed in situ X-ray diffraction study of GaAs nanowire growth on GaAs(111)B with Au catalyst. Experiments were carried out using a psic-type X-ray diffractometer integrated with an MBE chamber at BL11XU. With increasing deposition amount of GaAs, the structure of GaAs nanowires was found to transform from the zincblende to the wurtzite.