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Journal Articles

Applicability of redundant pairs of SOI transistors for analog circuits and their applications to phase-locked loop circuits

Makihara, Akiko*; Yokose, Tamotsu*; Tsuchiya, Yoshihisa*; Miyazaki, Yoshio*; Abe, Hiroshi; Shindo, Hiroyuki*; Ebihara, Tsukasa*; Maru, Akifumi*; Morikawa, Koichi*; Kuboyama, Satoshi*; et al.

IEEE Transactions on Nuclear Science, 60(1), p.230 - 235, 2013/02

 Times Cited Count:6 Percentile:44.02(Engineering, Electrical & Electronic)

no abstracts in English

Journal Articles

Applicability of redundant pairs of SOI transistors for analog circuits

Makihara, Akiko*; Yokose, Tamotsu*; Tsuchiya, Yoshihisa*; Tani, Koichi*; Morimura, Tadaaki*; Abe, Hiroshi; Shindo, Hiroyuki*; Ebihara, Tsukasa*; Maru, Akifumi*; Morikawa, Koichi*; et al.

Proceedings of 10th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-10) (Internet), p.119 - 122, 2012/12

no abstracts in English

Journal Articles

Characterization of microdose damage caused by single heavy ion observed in trench type power MOSFETs

Kuboyama, Satoshi*; Maru, Akifumi*; Ikeda, Naomi*; Hirao, Toshio; Tamura, Takashi*

IEEE Transactions on Nuclear Science, 57(6), p.3257 - 3261, 2010/12

 Times Cited Count:16 Percentile:72.36(Engineering, Electrical & Electronic)

no abstracts in English

Journal Articles

DICE-based flip-flop with SET pulse discriminator on a 90 nm bulk CMOS process

Maru, Akifumi*; Shindo, Hiroyuki*; Ebihara, Tsukasa*; Makihara, Akiko*; Hirao, Toshio; Kuboyama, Satoshi*

IEEE Transactions on Nuclear Science, 57(6), p.3602 - 3608, 2010/12

 Times Cited Count:12 Percentile:62.3(Engineering, Electrical & Electronic)

no abstracts in English

Journal Articles

Characterization of microdose damage caused by single heavy ion observed in trench type power MOSFETs

Ikeda, Naomi*; Kuboyama, Satoshi*; Maru, Akifumi*; Hirao, Toshio; Abe, Hiroshi; Tamura, Takashi*

Proceedings of 9th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-9), p.163 - 166, 2010/10

The trench structure showed an anomalously large degradation by heavy ion irradiation. For the trench structure, ions irradiated normal to the chip surface traverse the gate oxide along the entire length of the channel. Therefore, there is a possibility that the trapped holes resulting from the ion traverse introduce the anomalously large leakage current path. This phenomenon is apparently attributable to the microdose effect. In the previous report, the microdose effect was identified on both trench and planner type of power MOSFETs by real-time measurement of the threshold voltage shift during the heavy ion irradiation with very long range. In this study, detailed characterization of the microdose effects was carried out with several in species. As a result, several damage parameters introduced in the gate oxide by a single ion, such as physical damage size and trapped hole density in the damage region were estimated.

Journal Articles

DICE based flip-flop with SET pulse discriminator on a 90 nm bulk CMOS process

Maru, Akifumi*; Kuboyama, Satoshi*; Shindo, Hiroyuki*; Ebihara, Tsukasa*; Makihara, Akiko*; Hirao, Toshio; Tamura, Takashi*

Proceedings of 9th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-9), p.64 - 67, 2010/10

no abstracts in English

Oral presentation

Evaluation and development of a radiation hardness-by-design library for 0.15$$mu$$m SOI-ASIC

Shindo, Hiroyuki*; Maru, Akifumi*; Kuboyama, Satoshi*; Onoda, Shinobu; Hirao, Toshio; Oshima, Takeshi

no journal, , 

no abstracts in English

Oral presentation

Feasibility study on a 90 nm bulk CMOS process for applicability to space environments

Maru, Akifumi*; Kuboyama, Satoshi*; Shindo, Hiroyuki*; Ikeda, Naomi*; Tamura, Takashi*; Hirao, Toshio; Abe, Hiroshi; Onoda, Shinobu; Makino, Takahiro; Oshima, Takeshi

no journal, , 

no abstracts in English

Oral presentation

Study for establishment of radiation-resistant technologies for next-generation space applications

Maru, Akifumi*; Shindo, Hiroyuki*; Kuboyama, Satoshi*; Suzuki, Koichi*; Abe, Hiroshi; Onoda, Shinobu; Makino, Takahiro; Oshima, Takeshi

no journal, , 

no abstracts in English

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