Dosimetry for 110 keV electron beam processing

Seito, Hajime; Matsui, Shinjiro*; Hakoda, Teruyuki; Ishikawa, Masayoshi*; Haruyama, Yasuyuki; Kaneko, Hirohisa; Kimura, Jun*; Kojima, Takuji

Zairyo Gijutsu, 30(1), p.10 - 16, 2012/01

The dosimetry of a 110 keV electron beam (EB) irradiation field is studied using a calorimeter, film dosimeter, and Monte Carlo simulation. This is important base for dose control in practical processing to guarantee the process reproducibility and product reliability. The simulation results are validated on the measurement of the energy fluence obtained by the calorimeter at one position in the air plane at different distances from a beam exit window. The spatial dose distribution obtained from the simulation is compared to that obtained by the film dosimeter. They show good agreement within 5.0%. The precision of 5.0% is sufficient to control the surface modification of polymers and the development of semiconductor devices in practical radiation processing. These results suggest that film dosimetry results at just one position in the air plane are sufficient to determine the irradiation characteristics of the low energy EB, and to provide a base of quality control measures in practical radiation processing.