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Uchida, Kazuto*; Masuda, Tsukuru*; Hara, Shintaro*; Matsuo, Yoichi*; Liu, Y.*; Aoki, Hiroyuki; Asano, Yoshihiko*; Miyata, Kazuki*; Fukuma, Takeshi*; Ono, Toshiya*; et al.
ACS Applied Materials & Interfaces, 16(30), p.39104 - 39116, 2024/07
Times Cited Count:2 Percentile:56.37(Nanoscience & Nanotechnology)
-synuclein studied by quasielastic neutron scatteringFujiwara, Satoru; Araki, Katsuya*; Matsuo, Tatsuhito; Yagi, Hisashi*; Yamada, Takeshi*; Shibata, Kaoru; Mochizuki, Hideki*
PLOS ONE (Internet), 11(4), p.e0151447_1 - e0151447_17, 2016/04
Times Cited Count:27 Percentile:62.99(Multidisciplinary Sciences)
Matsuo, Yoichi*; Hase, Yoshihiro; Takeshita, Hiroki*; Notomi, Asako*
JAEA-Review 2014-050, JAEA Takasaki Annual Report 2013, P. 111, 2015/03
no abstracts in English
Oshima, Takeshi; Deki, Manato; Makino, Takahiro; Iwamoto, Naoya; Onoda, Shinobu; Hirao, Toshio*; Kojima, Kazutoshi*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*
AIP Conference Proceedings 1525, p.654 - 658, 2013/04
Times Cited Count:0 Percentile:0.00(Physics, Applied)Metal-Oxide-Semiconductor (MOS) capacitors were fabricated on n-type 4H-SiC epitaxial layers, and the leakage current through the gate oxide during heavy ion irradiation was investigated in order to evaluate dielectric breakdown induced by heavy ions (Single Event Gate Rupture: SEGR). The gate oxide at thickness ranges between 60 and 80 nm was formed using pyrogenic oxidation at 1100
C for 60 min. Circular electrodes with 180
diameter were formed using Al evaporation and a lift-off technique. The leakage current observed through the gate oxide was monitored during 18 MeV oxygen (O) or nickel (Ni) ions. As a result, although no significant difference in the value of the electric field at the dielectric breakdown (around 8.2 MV/cm) was observed between non-irradiated and 18 MeV-O irradiated samples, the value decreased to be 7.3 MV/cm in the case of 18 MeV-Ni ion incidence. The Linier Energy Transfer (LET) for 18 MeV-O is 7 MeV cm
/mg, and this value is smaller than that for 18 MeV-Ni (24 MeV cm
/mg). Also, 18 MeV-Ni ions deposit energy in narrower regions than 18 MeV-O ions. Thus, it can be concluded that the high density of charge induced by 18 MeV-Ni ions triggers SEGR in SiC MOS capacitors.
Hase, Yoshihiro; Nozawa, Shigeki; Okada, Tomoyuki*; Asami, Itsuo*; Nagatani, Takeshi*; Matsuo, Yoichi*; Kanazawa, Akira*; Honda, Kazushige*; Narumi, Issei
JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 95, 2013/01
Sonoda, Tetsu*; Wada, Michiharu*; Tomita, Hideki*; Sakamoto, Chika*; Takatsuka, Takaaki*; Furukawa, Takeshi*; Iimura, Hideki; Ito, Yuta*; Kubo, Toshiyuki*; Matsuo, Yukari*; et al.
Nuclear Instruments and Methods in Physics Research B, 295, p.1 - 10, 2013/01
Times Cited Count:21 Percentile:80.68(Instruments & Instrumentation)no abstracts in English
Hase, Yoshihiro; Nozawa, Shigeki; Okada, Tomoyuki*; Asami, Itsuo*; Nagatani, Takeshi*; Matsuo, Yoichi*; Kanazawa, Akira*; Honda, Kazushige*; Narumi, Issei
JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 100, 2012/01
Ito, Takuto*; Deki, Manato; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
Proceedings of 12th International Symposium on Laser Precision Microfabrication (LPM 2011) (Internet), 5 Pages, 2011/06
Deki, Manato; Ito, Takuto*; Yamamoto, Minoru*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
Applied Physics Letters, 98(13), p.133104_1 - 133104_3, 2011/03
Times Cited Count:13 Percentile:47.04(Physics, Applied)Deki, Manato; Ito, Takuto*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
Proceedings of 9th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-9), p.218 - 221, 2010/10
Tomita, Takuro*; Iwami, Masahiro*; Yamamoto, Minoru*; Deki, Manato*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Nakagawa, Yoshinori*; Kitada, Takahiro*; Isu, Toshiro*; Saito, Shingo*; et al.
Materials Science Forum, 645-648, p.239 - 242, 2010/04
no abstracts in English

Matsuo, Yoji*; Suzuki, Muneyasu*; Noguchi, Yuji*; Yoshimura, Takeshi*; Fujimura, Norifumi*; Yoshii, Kenji; Ikeda, Naoshi*; Mori, Shigeo*
Japanese Journal of Applied Physics, 47(11), p.8464 - 8467, 2008/11
Times Cited Count:11 Percentile:40.71(Physics, Applied)We have investigated the physical properties of LuFeCuO
, which is a derivative material of the electronic ferroelectric LuFe
O
. From electron diffraction measurements at room temperature, ionic ordering of Fe
and Cu
in the a-b plane was observed. This ordering is similar to that in LuFe
O
and has an electric dipole. The observation of small domains (5-10 nm) indicates the presence of polar regions. Dielectric measurements showed that a peak of dielectric constant appeared at around 500 K, and the peak value was about 1000, indicating that LuFeCuO
is a dielectric material. We will present the experimental data on the samples prepared under high-pressure oxygen.
Noda, Kenji; Sugimoto, Masayoshi; ; Matsuo, Hideto; Watanabe, Katsutoshi; Kikuchi, Teruo; Usui, Takeshi; Oyama, Yukio; Ono, Hideo; Kondo, Tatsuo
Journal of Nuclear Materials, 191-194, p.1367 - 1371, 1992/00
Times Cited Count:10 Percentile:67.11(Materials Science, Multidisciplinary)no abstracts in English
Ito, Takuto*; Deki, Manato; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
no journal, ,
no abstracts in English
Ito, Takuto*; Deki, Manato; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
no journal, ,
no abstracts in English
Ti
O
(R=Lu,Yb)Hoshiyama, Takuya*; Mori, Shigeo*; Matsuo, Yoji*; Funae, Takeshi*; Kambe, Takashi*; Ikeda, Naoshi*; Kimizuka, Noboru*; Yoshii, Kenji; Michiue, Yuichi*
no journal, ,
We have investigated the crystal structure and physical properties of RFe
Ti
O
(R=Lu,Yb). The samples were prepared by the solid-state reaction method in air. X-ray and electron diffraction measurements showed that the materials have the same crystal structure as that of multiferroic RMnO
. Magnetic measurements showed the absence of magnetic transition below 400 K. Dielectric measurements showed the peak of dielectric constant above room temperature, suggesting a existence of ferroelectric phase transition at high temperatures.
Deki, Manato; Ito, Takuto*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
no journal, ,
no abstracts in English
Deki, Manato; Ito, Takuto*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
no journal, ,
no abstracts in English
Fe
O
Fukuyama, Ryota*; Yoshii, Kenji; Kuroda, Tomoko*; Kitamura, Satoshi*; Funae, Takeshi*; Matsuo, Yoji*; Ikeda, Naoshi*; Kimizuka, Noboru*; Kambe, Takashi*
no journal, ,
We have investigated the physical properties of Lu
Fe
O
, which has a related structure to the electronic ferroelectric RFe
O
(R: rare earths). Magnetic measurements showed that its magnetic transition temperature was about 260-270 K. Dielectric measurements showed that dielectric constants at room temperature were about 10000. This material also showed a magneto-dielectric effect at around room temperature, a result which is interesting from the viewpoints of both fundamental and applied science.
Deki, Manato; Yamamoto, Minoru*; Ito, Takuto*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
no journal, ,
no abstracts in English