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Yogo, Akifumi*; Lan, Z.*; Arikawa, Yasunobu*; Abe, Yuki*; Mirfayzi, S. R.*; Wei, T.*; Mori, Takato*; Golovin, D.*; Hayakawa, Takehito*; Iwata, Natsumi*; et al.
Physical Review X, 13(1), p.011011_1 - 011011_12, 2023/01
Times Cited Count:1 Percentile:81.67(Physics, Multidisciplinary)Sato, Yuki; Murakami, Hiroyuki*; Shimaoka, Takehiro*; Tsubota, Masakatsu*; Kaneko, Junichi*
Nuclear Instruments and Methods in Physics Research A, 834, p.218 - 222, 2016/10
Times Cited Count:3 Percentile:29.7(Instruments & Instrumentation)Sato, Yuki; Murakami, Hiroyuki*; Shimaoka, Takehiro*; Tsubota, Masakatsu*; Kaneko, Junichi*
Japanese Journal of Applied Physics, 55(4), p.046401_1 - 046401_5, 2016/04
Times Cited Count:4 Percentile:21.01(Physics, Applied)We investigated the performance of a charged particle detector fabricated using single-crystal diamond grown by chemical vapor deposition. The detector was able to identify four different Am
-particle energies (5.389, 5.443, 5.486, and 5.545 MeV) because of its superior intrinsic energy resolution of
0.4% (full width at half maximum). The charge collection efficiency inside the diamond crystal was
98% for both electrons and holes. The diamond detector also exhibited no significant degradation in terms of pulse height spectra and energy resolution during operation for more than 100 h in the case of mainly electron drift inside the diamond crystal. In contrast, the shapes of the pulse height spectra measured under hole drift condition deteriorated due to the polarization phenomenon.
Polevoi, A. R.*; Loarte, A.*; Hayashi, Nobuhiko; Kim, H. S.*; Kim, S. H.*; Koechl, F.*; Kukushkin, A. S.*; Leonov, V. M.*; Medvedev, S. Yu.*; Murakami, Masakatsu*; et al.
Nuclear Fusion, 55(6), p.063019_1 - 063019_8, 2015/05
Times Cited Count:31 Percentile:84.94(Physics, Fluids & Plasmas)Polevoi, A. R.*; Hayashi, Nobuhiko; Kim, H. S.*; Kim, S. H.*; Koechl, F.*; Kukushkin, A. S.*; Leonov, V. M.*; Loarte, A.*; Medvedev, S. Yu.*; Murakami, Masakatsu*; et al.
Europhysics Conference Abstracts (Internet), 37D, p.P2.135_1 - P2.135_4, 2013/07
Motokawa, Ryuhei; Taniguchi, Tatsuo*; Sasaki, Yusuke*; Enomoto, Yuto*; Murakami, Fumiyasu*; Kasuya, Masakatsu*; Kori, Michinari*; Nakahira, Takayuki*
Macromolecules, 45(23), p.9435 - 9444, 2012/11
Times Cited Count:9 Percentile:27.8(Polymer Science)Izawa, Yasukazu*; Nishihara, Katsunobu*; Tanuma, Hajime*; Sasaki, Akira; Murakami, Masakatsu*; Sunahara, Atsushi*; Nishimura, Hiroaki*; Fujioka, Shinsuke*; Aota, Tatsuya*; Shimada, Yoshinori*; et al.
Journal of Physics; Conference Series, 112, p.042047_1 - 042047_4, 2008/00
Times Cited Count:8 Percentile:93.63In the development of a high power EUV source used in the EUV lithography system, we have been constructed EUV database of laser-produced tin plasma by the theoretical and experimental studies. On the basis of our understanding, the optimum conditions of lasers and plasmas were clarified, and we proposed the guidelines of laser plasma to obtain clean, efficient and high power EUV source for the practical EUV lithography system. In parallel to such studies, novel targets and high power laser system to generate the optimized EUV source plasma have been developed.
Nishihara, Katsunobu*; Sunahara, Atsushi*; Sasaki, Akira; Nunami, Masanori*; Tanuma, Hajime*; Fujioka, Shinsuke*; Shimada, Yoshinori*; Fujima, Kazumi*; Furukawa, Hiroyuki*; Kato, Takako*; et al.
Physics of Plasmas, 15(5), p.056708_1 - 056708_11, 2008/00
Times Cited Count:116 Percentile:97.46(Physics, Fluids & Plasmas)Kessel, C. E.*; Giruzzi, G.*; Sips, A. C. C.*; Budny, R. V.*; Artaud, J. F.*; Basiuk, V.*; Imbeaux, F.*; Joffrin, E.*; Schneider, M.*; Luce, T.*; et al.
Proceedings of 21st IAEA Fusion Energy Conference (FEC 2006) (CD-ROM), 8 Pages, 2007/03
no abstracts in English
Sasaki, Akira; Nishihara, Katsunobu*; Murakami, Masakatsu*; Koike, Fumihiro*; Kagawa, Takashi*; Nishikawa, Takeshi*; Fujima, Kazumi*; Kawamura, Toru*; Furukawa, Hiroyuki*
Applied Physics Letters, 85(24), p.5857 - 5859, 2004/12
Times Cited Count:42 Percentile:79.79(Physics, Applied)no abstracts in English
Fujima, Kazumi*; Nishihara, Katsunobu*; Kawamura, Toru*; Furukawa, Hiroyuki*; Kagawa, Takashi*; Koike, Fumihiro*; More, R.*; Murakami, Masakatsu*; Nishikawa, Takeshi*; Sasaki, Akira; et al.
Emerging Lithographic Technologies VIII, Proceedings of SPIE Vol.5374, p.405 - 412, 2004/00
no abstracts in English
Kubo, Hirotaka; Sugama, Hideo*; Murakami, Masakatsu*; Osawa, Yukiharu*
Purazuma, Kaku Yugo Gakkai-Shi, 77(12), p.1252 - 1253, 2001/12
no abstracts in English
Onodera, Seiji; Sono, Hiroki; Hirose, Hideyuki; Tanino, Shuichi; Kaminaga, Jota*; Myomae, Tomoki*; Murakami, Kiyonobu; Sakuraba, Koichi; Miyauchi, Masakatsu; Tonoike, Kotaro; et al.
JAERI-Tech 2000-059, 46 Pages, 2000/11
no abstracts in English
Onodera, Seiji; Sono, Hiroki; Hirose, Hideyuki; Tanino, Shuichi; Nagasawa, Makoto*; Murakami, Kiyonobu; Sakuraba, Koichi; Miyauchi, Masakatsu; Yamane, Yuichi; Ono, Akio
JAERI-Tech 2000-013, p.57 - 0, 2000/03
no abstracts in English
Onodera, Seiji; Sono, Hiroki; Hirose, Hideyuki; Tanino, Shuichi; Nagasawa, Makoto*; Murakami, Kiyonobu; Sakuraba, Koichi; Miyauchi, Masakatsu; Kikuchi, Tsukasa; Ono, Akio
JAERI-Tech 99-084, p.54 - 0, 1999/12
no abstracts in English
; ; Hirose, Hideyuki; *; *; Murakami, Kiyonobu; Takahashi, Tsukasa; Sakuraba, Koichi; Miyauchi, Masakatsu; ; et al.
JAERI-Tech 98-023, 66 Pages, 1998/06
no abstracts in English
Sato, Yuki; Murakami, Hiroyuki*; Shimaoka, Takehiro*; Tsubota, Masakatsu*; Kaneko, Junichi*
no journal, ,