Refine your search:     
Report No.
 - 
Search Results: Records 1-4 displayed on this page of 4
  • 1

Presentation/Publication Type

Initialising ...

Refine

Journal/Book Title

Initialising ...

Meeting title

Initialising ...

First Author

Initialising ...

Keyword

Initialising ...

Language

Initialising ...

Publication Year

Initialising ...

Held year of conference

Initialising ...

Save select records

Journal Articles

Non-Hookean large elastic deformation in bulk crystalline metals

Xu, S.*; Odaira, Takumi*; Sato, Shunsuke*; Xu, X.*; Omori, Toshihiro*; Harjo, S.; Kawasaki, Takuro; Seiner, H.*; Zoubkov$'a$, K.*; Murakami, Yasukazu*; et al.

Nature Communications (Internet), 13, p.5307_1 - 5307_8, 2022/09

 Times Cited Count:3 Percentile:68.76(Multidisciplinary Sciences)

Journal Articles

Crystallographical and morphological changes in charge-ordering transition of RFe$$_{2}$$O$$_{4}$$ (R: Y, Lu) investigated by transmission electron microscopy

Horibe, Yoichi*; Mori, Shigeo*; Ikeda, Naoshi*; Yoshii, Kenji; Maeno, Hiroshi*; Murakami, Yasukazu*

Ferroelectrics, 584(1), p.20 - 30, 2021/00

 Times Cited Count:1 Percentile:8.34(Materials Science, Multidisciplinary)

Temperature dependence of charge-ordered crystal structures and domain structures in RFe$$_{2}$$O$$_{4}$$ (R: Y and Lu) was investigated by energy-filtered transmission electron microscopy, combined with conventional transmission electron microscopy. The presence of three-dimensional to two-dimensional charge ordering transition were observed in both RFe$$_{2}$$O$$_{4}$$ on heating. Furthermore, real-space images obtained with the energy-filtered transmission electron microscopy revealed that YRFe$$_{2}$$O$$_{4}$$ has less anisotropic nanometer-scale charge-ordered domains than LuRFe$$_{2}$$O$$_{4}$$. These findings in RFe$$_{2}$$O$$_{4}$$ indicate the importance of the interchange interactions between Fe-O bilayers in addition to those within bilayers in the structural phase transitions associated with charge ordering in this system.

Journal Articles

EUV light source by high power laser

Izawa, Yasukazu*; Nishihara, Katsunobu*; Tanuma, Hajime*; Sasaki, Akira; Murakami, Masakatsu*; Sunahara, Atsushi*; Nishimura, Hiroaki*; Fujioka, Shinsuke*; Aota, Tatsuya*; Shimada, Yoshinori*; et al.

Journal of Physics; Conference Series, 112, p.042047_1 - 042047_4, 2008/00

 Times Cited Count:8 Percentile:93.57

In the development of a high power EUV source used in the EUV lithography system, we have been constructed EUV database of laser-produced tin plasma by the theoretical and experimental studies. On the basis of our understanding, the optimum conditions of lasers and plasmas were clarified, and we proposed the guidelines of laser plasma to obtain clean, efficient and high power EUV source for the practical EUV lithography system. In parallel to such studies, novel targets and high power laser system to generate the optimized EUV source plasma have been developed.

Journal Articles

Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography

Nishihara, Katsunobu*; Sunahara, Atsushi*; Sasaki, Akira; Nunami, Masanori*; Tanuma, Hajime*; Fujioka, Shinsuke*; Shimada, Yoshinori*; Fujima, Kazumi*; Furukawa, Hiroyuki*; Kato, Takako*; et al.

Physics of Plasmas, 15(5), p.056708_1 - 056708_11, 2008/00

 Times Cited Count:116 Percentile:97.42(Physics, Fluids & Plasmas)

4 (Records 1-4 displayed on this page)
  • 1