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Journal Articles

Fortran 90/95 code for computing the $$G(E)$$ function

Okubo, Yoshitaka*; Tanigaki, Minoru*; Tsuda, Shuichi

Nihon Genshiryoku Gakkai Wabun Rombunshi (Internet), 24(4), p.99 - 104, 2025/11

Scintillation detectors of various crystals and shapes as well as conventional NaI(Tl) and CsI(Tl) are widely used for gamma radiation dosimetry. The "dose-spectral conversion operator ($$G(E)$$ function)" has been developed as a method to derive dose rates directly from the pulse height distributions from scintillation detectors. Since the accident at the TEPCO's Fukushima Daiichi Nuclear Power Station, there has been a need for $$G(E)$$ function calculations for various scintillation detectors, but the program for this method, which was developed at the former Japan Atomic Energy Research Institute (JAERI), has not yet been made public, so it has been used only by a few specialists. Therefore, Kyoto University and JAEA, which have been developing a carborne survey system KURAMA-II, decided to rewrite the original program written in FORTRAN77 into Fortran90/95 and make it available to the public. This report describes the details of the program, bug fixes newly found this time, and calculation examples.

Journal Articles

Change in dislocation density via ausforming in Fe-5%Mn-C alloy with lath martensitic structure

Takanashi, Misa*; Hidaka, Ryota*; Okubo, Kota*; Masumura, Takuro*; Tsuchiyama, Toshihiro*; Morooka, Satoshi; Maeda, Takuya*; Nakamura, Shuichi*; Uemori, Ryuji*

ISIJ International, 65(9), p.1384 - 1393, 2025/08

Journal Articles

Change in dislocation density via ausforming in Fe-5%Mn-C alloy with lath martensitic structure

Takanashi, Misa*; Hidaka, Ryota*; Okubo, Kota*; Masumura, Takuro*; Tsuchiyama, Satoshi*; Morooka, Satoshi; Maeda, Takuya*; Nakamura, Shuichi*; Uemori, Ryuji*

Tetsu To Hagane, 111(9), p.503 - 513, 2025/06

Journal Articles

Radiation response of silicon carbide metal-oxide-semiconductor transistors in high dose region

Oshima, Takeshi; Yokoseki, Takashi; Murata, Koichi; Matsuda, Takuma; Mitomo, Satoshi; Abe, Hiroshi; Makino, Takahiro; Onoda, Shinobu; Hijikata, Yasuto*; Tanaka, Yuki*; et al.

Japanese Journal of Applied Physics, 55(1S), p.01AD01_1 - 01AD01_4, 2016/01

 Times Cited Count:16 Percentile:54.18(Physics, Applied)

Journal Articles

A Development of super radiation-hardened power electronics using silicon carbide semiconductors; Toward MGy-class radiation resistivity

Hijikata, Yasuto*; Mitomo, Satoshi*; Matsuda, Takuma*; Murata, Koichi*; Yokoseki, Takashi*; Makino, Takahiro; Takeyama, Akinori; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; et al.

Proceedings of 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-11) (Internet), p.130 - 133, 2015/11

Journal Articles

Software development of MT3-D for site investigation, 6; Audio frequency MT3-D inversion study in Horonobe, Hokkaido

Yoshimura, Kimitaka*; Sakashita, Susumu*; Okubo, Shuichi*; Yamane, Kazunobu*; Seya, Masami

Shadan Hojin Butsuri Tansa Gakkai Dai-115-Kai (Heisei-18-Nendo Shuki) Gakujutsu Koenkai Rombunshu, p.209 - 212, 2006/10

3D MT inversion development has been conducted to solve issues in electromagnetic exploration in the radioactive waste disposal area. Radioactive Waste Management Funding and Research Center (RWMC) operated field work to confirm how the 3D inversion code worked in low resistivity geology at Horonobe area, Hokkaido in 2005 and applied the code to AMT data. Data suggests possibility to estimate salinity of groundwater in the area of lower resistivety than 1ohm-m.

Journal Articles

Development of superconducting proton linac for ADS

Ouchi, Nobuo; Akaoka, Nobuo*; Asano, Hiroyuki*; Chishiro, Etsuji; Namekawa, Yuya*; Suzuki, Hiroyuki*; Ueno, Tomoaki*; Noguchi, Shuichi*; Kako, Eiji*; Ouchi, Norihito*; et al.

Proceedings of 4th International Workshop on the Utilisation and Reliability of High Power Proton Accelerators, p.175 - 183, 2005/11

no abstracts in English

Oral presentation

Optimum structures for $$gamma$$-ray radiation resistant SiC-MOSFETs

Takeyama, Akinori; Mitomo, Satoshi*; Matsuda, Takuma*; Murata, Koichi*; Yokoseki, Takashi*; Makino, Takahiro; Onoda, Shinobu; Oshima, Takeshi; Okubo, Shuichi*; Tanaka, Yuki*; et al.

no journal, , 

Oxide thickness dependence of $$gamma$$-ray irradiation response on Silicon Carbide (SiC) Metal-Oxide-Semiconductor Field Effect Transistors (MOSFETs) was investigated. As a result of irradiation, the threshold voltage V$$_{th}$$ for both SiC MOSFETs with gate oxide of 30 nm or 60 nm thick shifted to negative voltage-side gently. However, the V$$_{th}$$ for 60 nm thick more immediately decreased over 400 kGy. It is found that SiCMOSFETs with smaller thickness has a higher radiation tolerance.

Oral presentation

Effect of high temperature and humidity on dose dependence of charges generated in SiC MOSFETs due to $$gamma$$-ray irradiation

Takeyama, Akinori; Matsuda, Takuma*; Yokoseki, Takashi*; Mitomo, Satoshi*; Murata, Koichi*; Makino, Takahiro; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

Effect of $$gamma$$-ray irradiation under high temperature and humidity circumstances on the electrical characteristics of Silicon Carbide (SiC) Metal-Oxide-Semiconductor Field Effect Transistors (MOSFETs) was investigated. In the case of irradiation under high humidity circumstance, trapped oxide and interface charges densities generated due to irradiation were smaller than those for irradiation in dry circumstance. It is concluded that humidity circumstance suppressed the degradation of the electrical properties due to irradiation including threshold voltage shift and leakage current.

Oral presentation

$$gamma$$-ray irradiation effect on SiC MOSFETs with gate-bias voltage

Murata, Koichi; Mitomo, Satoshi; Matsuda, Takuma; Yokoseki, Takashi; Makino, Takahiro; Abe, Hiroshi; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

no abstracts in English

Oral presentation

Difference by the oxide fabrication process of the $$gamma$$-ray irradiation effect on SiC-MOSFET

Mitomo, Satoshi*; Matsuda, Takuma*; Murata, Koichi*; Yokoseki, Takashi; Makino, Takahiro; Abe, Hiroshi; Onoda, Shinobu; Oshima, Takeshi; Okubo, Shuichi*; Tanaka, Yuki*; et al.

no journal, , 

no abstracts in English

Oral presentation

Electrical properties of SiC MOSFETs irradiated with $$gamma$$-rays at elevated temperature

Matsuda, Takuma; Yokoseki, Takashi; Mitomo, Satoshi; Murata, Koichi; Makino, Takahiro; Takeyama, Akinori; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

Silicon carbide (SiC) is expected to be applied to Metal-Oxide-Semiconductor (MOS) FETs used in harsh radiation environments to decommission TEPCO Fukushima Daiichi nuclear reactors. To develop radiation resistant SiC MOS FETs, clarification of their radiation response under elevated temperature is required. We measured capacitance-voltage (C-V) characteristics of SiC MOSFETs irradiated with $$gamma$$-rays at 423 K in nitrogen atmosphere. The samples were vertical power 4H-SiC MOSFETs with the blocking voltage of 1200 V and the rated current of 20 A with the gate oxide thickness of 45 nm. Typical C-V curve of a SiC MOSFET irradiated even up to 5 kGy was shifted to negative voltage side, suggesting that the positive charges generated in gate oxide by irradiation. While, no significant change in the slope of the curve was observed, indicating that interface traps between the gate oxide and SiC were merely generated. The radiation response of SiC MOS FETs under elevated temperature predominantly depends on the amount of positive charges generated in the gate oxide.

Oral presentation

The Electrical characteristics of SiC-MOSFETs irradiated with $$gamma$$-rays at elevated temperature

Matsuda, Takuma; Yokoseki, Takashi; Mitomo, Satoshi; Murata, Koichi; Makino, Takahiro; Abe, Hiroshi; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

no abstracts in English

Oral presentation

Influence of gate bias on $$gamma$$-ray radiation response of SiC MOSFETs

Takeyama, Akinori; Murata, Koichi*; Mitomo, Satoshi*; Matsuda, Takuma*; Yokoseki, Takashi*; Makino, Takahiro; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

Deterioration of electrical property of SiCMOSFETs due to irradiation was reduced compared with no biased ones, when the SiC MOSFETs with switching bias were irradiated. In order to clarify this mechanism, SiCMOSFETs were irradiated up to 50 kGy with switching bias applied to gate oxide from 4.5 to 0 V. As a result, the large negative shift of threshold voltage V$$_{th}$$ due to irradiation with positive bias significantly recovered in the cases that the bias switched to zero. It shows electrical property of SiCMOSFETs were immediately relieved when applied bias was removed by switching.

Oral presentation

Influence of $$gamma$$-ray irradiation under high temperature and humidity circumstance on the electrical characteristics of SiC MOSFETs

Takeyama, Akinori; Matsuda, Takuma; Yokoseki, Takashi; Mitomo, Satoshi; Murata, Koichi; Makino, Takahiro; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

no abstracts in English

15 (Records 1-15 displayed on this page)
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