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Journal Articles

Fluorine-vacancy defects in fluorine-implanted silicon studied by electron paramagnetic resonance

Umeda, Takahide*; Isoya, Junichi*; Oshima, Takeshi; Onoda, Shinobu; Morishita, Norio; Okonogi, Kensuke*; Shiratake, Shigeru*

Applied Physics Letters, 97(4), p.041911_1 - 041911_3, 2010/07

https://doi.org/10.1063/1.3473763

Times Cited Count：5 Percentile：22.82(Physics, Applied)