Radio frequency plasma transition caused by gas puffing and/or direct current biasing using multiturn internal antenna

Yamauchi, Toshihiko; Kobayashi, Seiji*; Sugibayashi, Hideyuki*; Tachibana, Toshiyuki*; Naito, Shunya*; Kanno, Yoshinori*; Hiruta, Toshihito

Japanese Journal of Applied Physics, 51(1), p.01AA02_1 - 01AA02_7, 2012/01

https://doi.org/10.1143/JJAP.51.01AA02

In the beginning of this study, the RF (radio frequency) plasma by the internal antenna which is in contrast to that of the external antenna, was considered for the transition from the charged coupled plasma (CCP) to the inductively coupled plasma (ICP) not to be observed. On the contrary, in our plasma experiment by using the internal multi-turn RF antenna, the transition phenomenon was observed at the extent of 40 W in RF power. In this experiment, the relation between the gas pressure and the RF power on the transition from CCP to ICP indicated almost the same characteristic as Paschen's law. But the transition physics, or the absorption mechanism of RF power based on the collision dumping, was strongly complex. We have experimentally represented the CCP-ICP transition to study the physics using the original physical technique. Firstly, we changed the CCP into the ICP by the gas control. It was considered that the increase of the electron temperature caused the transition. Secondly, the decrease of gas pressure displayed the same meaning with the longer period of the self-pulse transition. Thirdly, the self-bias caused by RF power and the external bias applied between the RF antenna and the stage were described for the transition physics.

Counter-measure to prevent temperature rise of stand pipe and primary upper shielding in HTTR

Kunitomi, Kazuhiko; Tachibana, Yukio; *; Nakano, Masaaki*; Saikusa, Akio; Takeda, Takeshi; Iyoku, Tatsuo; ; Sawahata, Hiroaki; Okubo, Minoru; et al.

JAERI-Tech 97-040, 91 Pages, 1997/09

JAERI-Tech-97-040.pdf:2.51MB

no abstracts in English