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Hirano, Tatsumi*; Maeda, Takehiro*; Murata, Tetsuyuki*; Yamaki, Takahiro*; Matsubara, Eiichiro*; Shobu, Takahisa; Shiro, Ayumi*; Yasuda, Ryo*; Takamatsu, Daiko*
SPring-8/SACLA Riyo Kenkyu Seikashu (Internet), 11(1), p.49 - 57, 2023/02
Kitamura, Akane; Yamaki, Tetsuya*; Yuri, Yosuke*; Koshikawa, Hiroshi*; Sawada, Shinichi*; Yuyama, Takahiro*; Usui, Aya; Chiba, Atsuya*
Nuclear Instruments and Methods in Physics Research B, 460, p.254 - 258, 2019/12
Times Cited Count:2 Percentile:23.44(Instruments & Instrumentation)Poly(vinylidene-fluoride) (PVDF) film is suitable for investigation of the size of etchable ion tracks because we can clearly judge the finish of the track etching and the surrounding bulk area remains due to the high chemical stability. Thereby we can measure the radius of ion tracks of each ion. In this study, we focused on two irradiation conditions for controlling the size of etchable ion tracks of PVDF films. One was irradiation in an oxygen atmosphere and the other was a fullerene (C) cluster beam irradiation. SEM observation showed that the size of pores became larger by irradiation in an oxygen atmosphere. It was found that the oxidation of ion tracks widened the size of etchable ion tracks. The C irradiation caused larger etchable tracks on the PVDF surface. The result could represent the effect of local and simultaneous collisions by the swift aggregated ions.
Kitamura, Akane; Yamaki, Tetsuya; Yuri, Yosuke; Sawada, Shinichi; Yuyama, Takahiro
Nuclear Instruments and Methods in Physics Research B, 314, p.47 - 50, 2013/11
Times Cited Count:1 Percentile:11.56(Instruments & Instrumentation)Yuri, Yosuke; Ishizaka, Tomohisa; Yuyama, Takahiro; Ishibori, Ikuo; Okumura, Susumu; Kitamura, Akane; Yamaki, Tetsuya; Sawada, Shinichi
Proceedings of 1st International Beam Instrumentation Conference (IBIC 2012) (Internet), p.531 - 533, 2013/06
Morita, Kosuke*; Morimoto, Koji*; Kaji, Daiya*; Haba, Hiromitsu*; Ozeki, Kazutaka*; Kudo, Yuki*; Sumita, Takayuki*; Wakabayashi, Yasuo*; Yoneda, Akira*; Tanaka, Kengo*; et al.
Journal of the Physical Society of Japan, 81(10), p.103201_1 - 103201_4, 2012/10
Times Cited Count:161 Percentile:97.28(Physics, Multidisciplinary)An isotope of the 113th element, 113, was produced in a nuclear reaction with a Zn beam on a Bi target. We observed six consecutive decays following the implantation of a heavy particle in nearly the same position in the semiconductor detector, in extremely low background condition. The fifth and sixth decays are fully consistent with the sequential decays of Db and Lr both in decay energies and decay times. This indicates that the present decay chain consisted of 113, Rg (Z = 111), Mt (Z = 109), Bh (Z = 107), Db (Z = 105), and Lr (Z = 103) with firm connections. This result, together with previously reported results from 2004 and 2007, conclusively leads the unambiguous production and identification of the isotope 113, of the 113th element.
*; Saido, Masahiro; Nakamura, Kazuyuki; Akiba, Masato; ; Goto, Yoshitaka*; *; *; Yamaki, Takahiro*; *; et al.
Journal of Nuclear Materials, 233-237(PT.A), p.781 - 786, 1996/00
Times Cited Count:13 Percentile:72.41(Materials Science, Multidisciplinary)no abstracts in English
Sasase, Masato*; *; Yamaki, Takahiro*; Takano, Ichiro*; *
Thin Solid Films, 281-282, p.431 - 435, 1996/00
Times Cited Count:6 Percentile:39.02(Materials Science, Multidisciplinary)no abstracts in English
Yamaki, Takahiro*; Goto, Yoshitaka*; Ando, Toshiro; Jimbo, Ryutaro*; Ogiwara, Norio; Saido, Masahiro
Journal of Nuclear Materials, 217(1-2), p.154 - 160, 1994/11
Times Cited Count:11 Percentile:69.02(Materials Science, Multidisciplinary)no abstracts in English
Goto, Yoshitaka*; Yamaki, Takahiro*; Ando, Toshiro; Jimbo, Ryutaro*; Ogiwara, Norio; Saido, Masahiro; Teruyama, Kazuhiro*
Journal of Nuclear Materials, 196-198, p.708 - 712, 1992/12
Times Cited Count:19 Percentile:83.6(Materials Science, Multidisciplinary)no abstracts in English
Kitamura, Akane; Yamaki, Tetsuya; Yuri, Yosuke; Sawada, Shinichi; Yuyama, Takahiro
no journal, ,
no abstracts in English
Kitamura, Akane; Yuri, Yosuke; Yuyama, Takahiro; Ishizaka, Tomohisa; Yamaki, Tetsuya; Koshikawa, Hiroshi; Sawada, Shinichi
no journal, ,
no abstracts in English
Kitamura, Akane; Yamaki, Tetsuya; Yuri, Yosuke; Koshikawa, Hiroshi; Sawada, Shinichi; Yuyama, Takahiro
no journal, ,
Kitamura, Akane; Yamaki, Tetsuya*; Yuri, Yosuke*; Koshikawa, Hiroshi*; Sawada, Shinichi*; Yuyama, Takahiro*
no journal, ,
Ion track membranes of polyvinylidene fluoride (PVDF) are produced by chemical etching using a strong oxidant in an alkali solution after irradiation with an ion beam in vacuum. The oxidant erodes not only ion tracks but also a pristine surface of PVDF. Therefore, it causes serious deterioration in the quality of PVDF membranes. We have developed a track etching technique without any oxidant by irradiation with an ion beam in an oxygen atmosphere. PVDF films were irradiated with 330-MeV Ar ions in an oxygen atmosphere using a uniform-beam formation/irradiation system developed at the TIARA AVF-cyclotron facility. The maximum etching rate resulting from the present method was six times faster than that from the conventional method; furthermore, the maximum diameter of track-etched pores with the present method was more than twice as large as that in the conventional method. This suggests that the irradiation in oxygen can provide a useful technique of an oxidant-free track-etching process.
Kitamura, Akane; Yamaki, Tetsuya*; Yuri, Yosuke*; Koshikawa, Hiroshi*; Sawada, Shinichi*; Yuyama, Takahiro*
no journal, ,
Ion track membranes of polyvinylidene fluoride (PVDF) are produced by chemical etching using a strong oxidant in an alkali solution after irradiation with an ion beam in vacuum. The oxidant erodes not only ion tracks but also a pristine surface of PVDF. Therefore, it causes serious deterioration in the quality of PVDF membranes. We have developed a track etching technique without any oxidant by irradiation with an ion beam in an oxygen atmosphere. PVDF films were irradiated with 330-MeV Ar ions in an oxygen atmosphere using a uniform-beam formation/irradiation system developed at the AVF-cyclotron of the TIARA facility. The maximum etching rate was six times faster than that from the conventional method; furthermore, the maximum diameter of track-etched pores was more than twice as large as that in the conventional method. FT-IR results showed that more oxygen-containing functional groups were formed on the surface irradiated in an oxygen atmosphere. Those were both caused by oxidation of ion tracks and the oxidation of ion tracks widened the size of etchable ion tracks. This suggests that the irradiation in oxygen can provide a useful technique of an oxidant-free track-etching process.