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Journal Articles

Ge diffusion and bonding state change in metal/high-$$k$$/Ge gate stacks and its impact on electrical properties

Hosoi, Takuji*; Hideshima, Iori*; Tanaka, Ryohei*; Minoura, Yuya*; Yoshigoe, Akitaka; Teraoka, Yuden; Shimura, Takayoshi*; Watanabe, Heiji*

Microelectronic Engineering, 109, p.137 - 141, 2013/09

https://doi.org/10.1016/j.mee.2013.03.115
 Times Cited Count：12 Percentile：51.83(Engineering, Electrical & Electronic)

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