ZnO as fast scintillation devices for the next generation lithography evaluated with Ni-like Ag laser

Furukawa, Yusuke*; Murakami, Hidetoshi*; Sarukura, Nobuhiko*; Tanaka, Momoko; Nishikino, Masaharu; Nagashima, Keisuke; Kimura, Toyoaki; Yamatani, Hiroshi; Yoshikawa, Akira*; Fukuda, Tsuguo*

no journal, , 

Using Ni-like Ag extreme ultraviolet (EUV) laser operated at 13.9-nm, ZnO is shown to be the excellent scintillator in this wavelength region with sufficiently short response time of less than 3 nsec and prominent peak fluorescence originated form exciton at 380 nm.