Atomic processes in the LPP and LA-DPP EUV sources

Sasaki, Akira; Nishihara, Katsunobu*; Sunahara, Atsushi*; Furukawa, Hiroyuki*; Nishikawa, Takeshi*; Koike, Fumihiro*

Alternative Lithographic Technologies (Proceedings of SPIE Vol.7271), p.727130_1 - 727130_8, 2009/03

We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission efficiently. We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.