Characterization of boron carbonitride (BCN) thin films deposited by radiofrequency and microwave plasma enhanced chemical vapor deposition

Mannan, M. A.*; Nagano, Masamitsu*; Shigezumi, Kazuya*; Kida, Tetsuya*; Hirao, Norie*; Baba, Yuji

American Journal of Applied Sciences, 5(6), p.736 - 741, 2008/00

https://doi.org/10.3844/ajassp.2008.736.741

Boron carbonitride thin films with a thickness of 4 micrometer were synthesized on Si(100) substrate by radiofrequency and microwave plasma enhanced vapor deposition using trimethylamine boran as a precursor. It has bee observed that the films were adhered well to the silicon substrate even after being broken mechanically. X-ray diffraction (XRD) and filed emission scanning electron microscopy (FE-SEM) results showed that the films were amorphous and the surface was rough with inhomogeneous microstructure. On the basis of the X-ray photoelectron spectra (XPS), it was elucidated that B, C and N atoms have different chemical bonds such as B-N, B-C and C-N.