X-ray devices and the possibility of applying nanophotonics

Koike, Masato; Miyauchi, Shinji*; Sano, Kazuo*; Imazono, Takashi

Nanophotonics and Nanofabrication, p.179 - 191, 2009/05

Multilayer gratings having a groove density of 7600 lines/mm have been fabricated by depositing Mo/SiO multilayer coating on the surface of laminar-type master gratings fabricated by use of a new lithography machine based on optical near field technologies. The diffraction efficiency was measured by reflectometers in the wavelength range of 0.7 - 2.0 nm at a synchrotron radiation facility. The multilayer grating having a groove depth of 3 nm and multilayer period length of 5.33 nm showed diffraction efficiencies of 0.032 at 0.70 nm (1.77 keV) and 0.016 at 1.19 nm (1.04 keV) were observed for the incidence angles of 88.020 deg and 85.230 deg, respectively. We also discuss an analysis of the roughness in terms of Debye-Waller factor comparing the experimental and theoretical diffraction efficiencies.