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Sumita, Takehiro; Sudo, Ayako; Takano, Masahide; Ikeda, Atsushi
Science and Technology of Advanced Materials; Methods (Internet), 2(1), p.50 - 54, 2022/02
Sumiya, Masatomo*; Sumita, Masato*; Tsuda, Yasutaka; Sakamoto, Tetsuya; Sang, L.*; Harada, Yoshitomo*; Yoshigoe, Akitaka
Science and Technology of Advanced Materials, 23(1), p.189 - 198, 2022/00
Times Cited Count:6 Percentile:47.37(Materials Science, Multidisciplinary)GaN is an attracting material for power-electronic devices. Understanding the oxidation at GaN surface is important for improving metal-oxide-semiconductor (MOS) devices. In this study, the oxidation at GaN surfaces depending on the GaN crystal planes (+c, -c, and m-plane) was investigated by real time XPS and DFT-MD simulation. We found that HO vapor has the highest reactivity due to the spin interaction between HO and GaN surfaces. The bond length between the Ga and N on the -c GaN surface was increased by OH attacking the back side of three-fold Ga atom. The chemisorption on the m-plane was dominant. The intense reactions of oxidation and AlGaN formation for p-GaN were observed at the interface of the AlO layer deposited by ALD using HO vapor. This study suggests that an oxidant gas other than HO and O should be used to avoid unintentional oxidation during AlGaN atomi layer deposition.
Kwon, H.*; Harjo, S.; Kawasaki, Takuro; Gong, W.; Jeong, S. G.*; Kim, E. S.*; Sathiyamoorthi, P.*; Kato, Hidemi*; Kim, H. S.*
Science and Technology of Advanced Materials, 23(1), p.579 - 586, 2022/00
Times Cited Count:6 Percentile:47.37(Materials Science, Multidisciplinary)Tremsin, A. S.*; Gao, Y.*; Dial, L. C.*; Grazzi, F.*; Shinohara, Takenao
Science and Technology of Advanced Materials, 17(1), p.324 - 336, 2016/07
Times Cited Count:20 Percentile:53.64(Materials Science, Multidisciplinary)Kuroiwa, Sogo*; Takagiwa, Hiroyuki*; Yamazawa, Maki*; Akimitsu, Jun*; Koda, Akihiro*; Kadono, Ryosuke*; Oishi, Kazuki; Higemoto, Wataru; Watanabe, Isao*
Science and Technology of Advanced Materials, 7(1), p.12 - 16, 2006/01
Times Cited Count:5 Percentile:21.98(Materials Science, Multidisciplinary)The temperature dependence of muon spin relaxation rate exhibits a significant increase below 130 K in CaB and 110 K in BaB, while no sigh of spontaneous muon precession signal under a zero field is observed. Moreover, the electric field gradient at the boron site measured by muon level-crossing resonance exhibits a step like change at 110 K in CaB. These results suggest a change in electronic state and the associated emergence of weak random magnetism below 110-130 K in these alkaline earth hexaborides.